Patents by Inventor Tetsuya Inukai

Tetsuya Inukai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200132579
    Abstract: The present invention addresses the problem of evaluating the hydrophobicity of a powder. According to the present invention, a powder is charged into a mixed solvent composed of a lipophilic solvent and a hydrophilic solvent, the voltage rate R of the mixed solvent is measured at predetermined time intervals while adding a lipophilic solvent to the mixed solvent charged with the powder, a parameter x correlating with the concentration of powder is defined for an arbitrary voltage rate R, a continuous function HP(x) of the ratio of a lipophilic solvent corresponding to x is defined, and HP(x) for required x is set as a representative value of a lipophilic solvent ratio distribution and used as an index of hydrophobicity.
    Type: Application
    Filed: May 23, 2018
    Publication date: April 30, 2020
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tetsuya INUKAI, Mitsugu SAITO, Tomoki OKAWA, Masanao KAMEI, Hiroyuki MORIYA, Chihiro HAYAKAWA, Hiroko KIKUCHI, Ryuichi INABA
  • Patent number: 9484159
    Abstract: A silicon oxide material having a cobalt content of 2-200 ppm is provided. A negative electrode is formed using the silicon oxide material as active material. A nonaqueous electrolyte secondary battery constructed using the negative electrode exhibits improved cycle performance while maintaining the high battery capacity and low volume expansion of silicon oxide.
    Type: Grant
    Filed: December 9, 2013
    Date of Patent: November 1, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hirofumi Fukuoka, Mitsugu Saito, Susumu Ueno, Tetsuya Inukai
  • Patent number: 9293763
    Abstract: Particulate silicon oxide having a Cu content of 100-20,000 ppm, an Fe content of 20-1,000 ppm, an Al content of up to 1,000 ppm, an average particle size of 0.1-30 ?m, and a BET specific surface area of 0.5-30 m2/g is used as negative electrode material in constructing a nonaqueous electrolyte secondary battery. The secondary battery is improved in cycle performance while maintaining the high battery capacity and low volume expansion of silicon oxide.
    Type: Grant
    Filed: October 22, 2013
    Date of Patent: March 22, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hirofumi Fukuoka, Mitsugu Saito, Susumu Ueno, Tetsuya Inukai
  • Publication number: 20140162123
    Abstract: A silicon oxide material having a cobalt content of 2-200 ppm is provided. A negative electrode is formed using the silicon oxide material as active material. A nonaqueous electrolyte secondary battery constructed using the negative electrode exhibits improved cycle performance while maintaining the high battery capacity and low volume expansion of silicon oxide.
    Type: Application
    Filed: December 9, 2013
    Publication date: June 12, 2014
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hirofumi FUKUOKA, Mitsugu SAITO, Susumu UENO, Tetsuya INUKAI
  • Publication number: 20140113192
    Abstract: Particulate silicon oxide having a Cu content of 100-20,000 ppm, an Fe content of 20-1,000 ppm, an Al content of up to 1,000 ppm, an average particle size of 0.1-30 ?m, and a BET specific surface area of 0.5-30 m2/g is used as negative electrode material in constructing a nonaqueous electrolyte secondary battery. The secondary battery is improved in cycle performance while maintaining the high battery capacity and low volume expansion of silicon oxide.
    Type: Application
    Filed: October 22, 2013
    Publication date: April 24, 2014
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hirofumi FUKUOKA, Mitsugu SAITO, Susumu UENO, Tetsuya INUKAI
  • Patent number: 7521574
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.
    Type: Grant
    Filed: October 18, 2005
    Date of Patent: April 21, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
  • Patent number: 7420075
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.
    Type: Grant
    Filed: August 16, 2004
    Date of Patent: September 2, 2008
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
  • Patent number: 7279590
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: October 9, 2007
    Assignee: Shin-Estu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Patent number: 7179933
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2–8 wt % of tin and 4–20 wt % of phosphorus which is powdered by atomization.
    Type: Grant
    Filed: March 17, 2005
    Date of Patent: February 20, 2007
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Publication number: 20060084821
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.
    Type: Application
    Filed: October 18, 2005
    Publication date: April 20, 2006
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
  • Patent number: 6984748
    Abstract: In a Rochow process, organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst and a co-catalyst. The invention uses as the co-catalyst a powder of co-catalyst active element-copper alloy containing substantial strain energy because this co-catalyst can reduce the activation time taken until a steady state is reached, which has been an outstanding problem in Rochow reaction, maintain the steady state over time and increase the selectivity of desired diorganodihalosilane for eventually increasing the yield based on the starting silicon.
    Type: Grant
    Filed: April 10, 2002
    Date of Patent: January 10, 2006
    Assignee: Shin-Etsu Chemical Co., LTD
    Inventors: Mikio Aramata, Hideaki Ozeki, Akio Muraida, Susumu Ueno, Toshio Shinohara, Tetsuya Inukai
  • Publication number: 20050209474
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Publication number: 20050209475
    Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2-8 wt % of tin and 4-20 wt % of phosphorus which is powdered by atomization.
    Type: Application
    Filed: March 17, 2005
    Publication date: September 22, 2005
    Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
  • Patent number: 6894181
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: May 17, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20050043557
    Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.
    Type: Application
    Filed: August 16, 2004
    Publication date: February 24, 2005
    Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
  • Patent number: 6727376
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: April 27, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20030199705
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Application
    Filed: April 23, 2003
    Publication date: October 23, 2003
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Publication number: 20030055277
    Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.
    Type: Application
    Filed: August 29, 2002
    Publication date: March 20, 2003
    Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
  • Patent number: 6506923
    Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: January 14, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
  • Publication number: 20020183536
    Abstract: In a Rochow process, organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst and a co-catalyst. The invention uses as the co-catalyst a powder of co-catalyst active element-copper alloy containing substantial strain energy because this co-catalyst can reduce the activation time taken until a steady state is reached, which has been an outstanding problem in Rochow reaction, maintain the steady state over time and increase the selectivity of desired diorganodihalosilane for eventually increasing the yield based on the starting silicon.
    Type: Application
    Filed: April 10, 2002
    Publication date: December 5, 2002
    Inventors: Mikio Aramata, Hideaki Ozeki, Akio Muraida, Susumu Ueno, Toshio Shinohara, Tetsuya Inukai