Patents by Inventor Tetsuya Kimijima
Tetsuya Kimijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8597584Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.Type: GrantFiled: May 19, 2010Date of Patent: December 3, 2013Assignees: Taiyo Nippon Sanso CorporationInventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
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Publication number: 20100247395Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.Type: ApplicationFiled: May 19, 2010Publication date: September 30, 2010Applicants: TAIYO NIPPON SANSO CORPORATIONInventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
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Patent number: 7744836Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.Type: GrantFiled: May 26, 2003Date of Patent: June 29, 2010Assignees: Taiyo Nippon Sanso CorporationInventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
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Publication number: 20060165573Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.Type: ApplicationFiled: May 26, 2003Publication date: July 27, 2006Applicant: TAIYO NIPPON SANSO CORPORATIONInventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
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Patent number: 6857324Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1?P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.Type: GrantFiled: April 14, 2003Date of Patent: February 22, 2005Assignee: Nippon Sanso CorporationInventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
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Patent number: 6823743Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.Type: GrantFiled: March 26, 2002Date of Patent: November 30, 2004Assignee: Nippon Sanso CorporationInventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
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Patent number: 6717666Abstract: The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas. At least one wavelength for measuring a concentration of nitrogen according to the intensity of a light generated by discharge, is selected from a group consisting of 215±2 nm, 226±2 nm, 238±2 nm, 242±2 nm, 246±1 nm, 256±2 nm, 260±2 nm, 266±2 nm, 271±1 nm, 276±4 nm, 285±2 nm, 294±1 nm, and 300±2 nm.Type: GrantFiled: March 18, 2002Date of Patent: April 6, 2004Assignee: Nippon Sanso CorporationInventors: Tetsuya Satou, Shang-Qian Wu, Tetsuya Kimijima
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Publication number: 20030172723Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.Type: ApplicationFiled: April 14, 2003Publication date: September 18, 2003Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
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Patent number: 6605134Abstract: There is provided a method and an apparatus for collecting a rare gas, which are capable of effectively collecting the rare gas contained in an exhaust gas exhausted from a rare gas using apparatus such as a plasma apparatus or the like, and moreover capable of securely supplying the rare gas having a predetermined purity to the rare gas using apparatus, and the method for collecting rare gas which comprises collecting a rare gas contained in an exhaust gas exhausted from a rare gas using apparatus operated under decompression, the method comprises the step of collecting the rare gas by separating the rare gas and impurities contained in the exhaust gas via at least two gas separating steps.Type: GrantFiled: September 14, 2001Date of Patent: August 12, 2003Assignee: Nippon Sanso CorporationInventors: Yoshio Ishihara, Shigeru Hayashida, Toru Nagasaka, Tetsuya Kimijima, Tadahiro Ohmi
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Patent number: 6550308Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.Type: GrantFiled: April 4, 2002Date of Patent: April 22, 2003Assignee: Nippon Sanso CorporationInventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
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Publication number: 20030046983Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.Type: ApplicationFiled: March 26, 2002Publication date: March 13, 2003Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
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Patent number: 6478040Abstract: Gas supplying apparatus and gas substitution method where machinery and parts constituting the gas system are not damaged, and where gas substitution in the gas system is carried out in a short time with good efficiency.Type: GrantFiled: July 6, 2000Date of Patent: November 12, 2002Assignee: Nippon Sanso CorporationInventors: Tsutomu Kikuchi, Tetsuya Satou, Akira Nishina, Tetsuya Kimijima
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Publication number: 20020144535Abstract: A method and an apparatus for producing a gas containing metal particles are described, by which the metal particles can be generated quite easily in a state similar to that in real use. Also, a method and an apparatus for evaluating a particle counter or a particle trapper by using the gas containing metal particles are described, in which the evaluation is performed under the conditions similar to those in real use. The gas containing metal particles is produced by conducting a carrier gas through a hollow metal tube and simultaneously heating the hollow metal tube to produce metal particles by vaporization effect. The pressure and the flow rate of the carrier gas and the heating amount can be controlled to produce metal particles having a required size distribution and a required concentration.Type: ApplicationFiled: March 7, 2002Publication date: October 10, 2002Inventors: Susumu Sakata, Tetsuya Kimijima, Yutaka Kimura
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Publication number: 20020140932Abstract: The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas.Type: ApplicationFiled: March 18, 2002Publication date: October 3, 2002Inventors: Tetsuya Satou, Shang-Qian Wu, Tetsuya Kimijima
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Publication number: 20020108429Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.Type: ApplicationFiled: April 4, 2002Publication date: August 15, 2002Applicant: NIPPON SANSO CORPORATIONInventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
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Publication number: 20020111747Abstract: The present invention provides an analysis system and analysis method for constantly monitoring gases, characterized in that in case there occurs a data discrepancy in an analyzer, the constant and continuous monitoring condition can be backed up while examining the cause of the problem can be carried out at the same time.Type: ApplicationFiled: January 29, 2002Publication date: August 15, 2002Inventors: Akira Nishina, Tsutomu Kikuchi, Tetsuya Kimijima
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Patent number: 6418781Abstract: An analyzing apparatus for assaying various kinds of trace impurity contents in various kinds of high-purity gases, having an atmospheric pressure ionization mass spectrometer useful for determination of trace impurity contents in such high-purity gases on the ppb to sub ppb levels and a gas chromatograph integrated therewith, enabling high efficiency determination of trace impurity contents in high-purity gases. The analyzing apparatus having a gas chromatograph (8) and an atmospheric pressure ionization mass spectrometer (6), is provided with a system (10) for introducing a sample gas introduced from a sample gas introduction source directly to the atmospheric pressure ionization mass spectrometer (6); a system (14a, 14b) for introducing the sample gas via the gas chromatograph (8) to the atmospheric pressure ionization mass spectrometer (6); and a channel selector (11, 13, 15) for changing over the channel of the sample gas to either of these two systems.Type: GrantFiled: December 8, 1999Date of Patent: July 16, 2002Assignee: Nippon Sanso CorporationInventors: Akira Nishina, Tsutomu Kikuchi, Makoto Tanaka, Hidetoshi Yoshida, Tetsuya Kimijima
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Patent number: 6397660Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.Type: GrantFiled: January 31, 2001Date of Patent: June 4, 2002Assignee: Nippon Sanso CorporationInventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
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Publication number: 20020062680Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.Type: ApplicationFiled: January 31, 2001Publication date: May 30, 2002Applicant: Nippon Sanso CorporationInventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
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Patent number: 6375911Abstract: A process and an apparatus for treating an exhaust gas, in which a raw gas and high-boiling intermediate products contained in the exhaust gas let out from a CVD system employing a silicon-containing gas is brought into contact with a transition metal such as nickel or a silicide of such transition metals to decompose or convert them into stable halides, followed by detoxication treatment of the harmful components contained in the exhaust gas.Type: GrantFiled: August 13, 1999Date of Patent: April 23, 2002Assignee: Nippon Sanso CorporationInventors: Tadahiro Ohmi, Yoshio Ishihara, Koh Matsumoto, Tetsuya Kimijima