Patents by Inventor Tetsuya Kimijima

Tetsuya Kimijima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8597584
    Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.
    Type: Grant
    Filed: May 19, 2010
    Date of Patent: December 3, 2013
    Assignees: Taiyo Nippon Sanso Corporation
    Inventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
  • Publication number: 20100247395
    Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.
    Type: Application
    Filed: May 19, 2010
    Publication date: September 30, 2010
    Applicants: TAIYO NIPPON SANSO CORPORATION
    Inventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
  • Patent number: 7744836
    Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.
    Type: Grant
    Filed: May 26, 2003
    Date of Patent: June 29, 2010
    Assignees: Taiyo Nippon Sanso Corporation
    Inventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
  • Publication number: 20060165573
    Abstract: This gas purifying process removes trace constituents from a mixed gas that includes a rare gas and nitrogen as main components, and at least one from among hydrogen, nitrogen and hydrogen reaction products, and water vapor as the trace constituent. This process sequentially carries out an adsorbing step for removing water vapor and nitrogen and hydrogen reaction products; a hydrogen oxidation step for converting the hydrogen into water vapor by means of a hydrogen oxidation catalytic reaction in the presence of oxygen; and a drying step for removing water vapor generated in the hydrogen oxidation step. When nitrogen oxides are included as a trace constituent, then a denitration step is carried out prior to the adsorbing step, to convert nitrogen oxides into nitrogen and water vapor by means of a catalytic denitration reaction in the presence of a reducing substance.
    Type: Application
    Filed: May 26, 2003
    Publication date: July 27, 2006
    Applicant: TAIYO NIPPON SANSO CORPORATION
    Inventors: Tadahiro Ohmi, Ryuichi Yazaki, Masato Kawai, Tetsuya Kimijima, Kunio Matsuda
  • Patent number: 6857324
    Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1?P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: February 22, 2005
    Assignee: Nippon Sanso Corporation
    Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
  • Patent number: 6823743
    Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: November 30, 2004
    Assignee: Nippon Sanso Corporation
    Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
  • Patent number: 6717666
    Abstract: The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas. At least one wavelength for measuring a concentration of nitrogen according to the intensity of a light generated by discharge, is selected from a group consisting of 215±2 nm, 226±2 nm, 238±2 nm, 242±2 nm, 246±1 nm, 256±2 nm, 260±2 nm, 266±2 nm, 271±1 nm, 276±4 nm, 285±2 nm, 294±1 nm, and 300±2 nm.
    Type: Grant
    Filed: March 18, 2002
    Date of Patent: April 6, 2004
    Assignee: Nippon Sanso Corporation
    Inventors: Tetsuya Satou, Shang-Qian Wu, Tetsuya Kimijima
  • Publication number: 20030172723
    Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.
    Type: Application
    Filed: April 14, 2003
    Publication date: September 18, 2003
    Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
  • Patent number: 6605134
    Abstract: There is provided a method and an apparatus for collecting a rare gas, which are capable of effectively collecting the rare gas contained in an exhaust gas exhausted from a rare gas using apparatus such as a plasma apparatus or the like, and moreover capable of securely supplying the rare gas having a predetermined purity to the rare gas using apparatus, and the method for collecting rare gas which comprises collecting a rare gas contained in an exhaust gas exhausted from a rare gas using apparatus operated under decompression, the method comprises the step of collecting the rare gas by separating the rare gas and impurities contained in the exhaust gas via at least two gas separating steps.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: August 12, 2003
    Assignee: Nippon Sanso Corporation
    Inventors: Yoshio Ishihara, Shigeru Hayashida, Toru Nagasaka, Tetsuya Kimijima, Tadahiro Ohmi
  • Patent number: 6550308
    Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: April 22, 2003
    Assignee: Nippon Sanso Corporation
    Inventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
  • Publication number: 20030046983
    Abstract: A method and an apparatus for measuring the concentrations of the components of a fluid are described, which can be used to measure the concentrations of the components continuously in real time and to monitor a high pressure gas, and is suitably used for in-line monitoring. In the method and the apparatus, a fluid sample is conducted through a measuring tube, wherein the measuring tube has a small aperture with a constant diameter in a fluid flow path. The pressure difference (P1−P2) between the upstream and the downstream of the small aperture and the flow rate at the downstream of the small aperture are measured to determine the concentrations of the components of the fluid.
    Type: Application
    Filed: March 26, 2002
    Publication date: March 13, 2003
    Inventors: Tetsuya Sato, Shang-Qian Wu, Tetsuya Kimijima
  • Patent number: 6478040
    Abstract: Gas supplying apparatus and gas substitution method where machinery and parts constituting the gas system are not damaged, and where gas substitution in the gas system is carried out in a short time with good efficiency.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: November 12, 2002
    Assignee: Nippon Sanso Corporation
    Inventors: Tsutomu Kikuchi, Tetsuya Satou, Akira Nishina, Tetsuya Kimijima
  • Publication number: 20020144535
    Abstract: A method and an apparatus for producing a gas containing metal particles are described, by which the metal particles can be generated quite easily in a state similar to that in real use. Also, a method and an apparatus for evaluating a particle counter or a particle trapper by using the gas containing metal particles are described, in which the evaluation is performed under the conditions similar to those in real use. The gas containing metal particles is produced by conducting a carrier gas through a hollow metal tube and simultaneously heating the hollow metal tube to produce metal particles by vaporization effect. The pressure and the flow rate of the carrier gas and the heating amount can be controlled to produce metal particles having a required size distribution and a required concentration.
    Type: Application
    Filed: March 7, 2002
    Publication date: October 10, 2002
    Inventors: Susumu Sakata, Tetsuya Kimijima, Yutaka Kimura
  • Publication number: 20020140932
    Abstract: The present invention provides a method and an apparatus for analyzing nitrogen in a gas, in which the concentration of nitrogen can be continuously measured with good sensitivity without wasting a sample gas.
    Type: Application
    Filed: March 18, 2002
    Publication date: October 3, 2002
    Inventors: Tetsuya Satou, Shang-Qian Wu, Tetsuya Kimijima
  • Publication number: 20020108429
    Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.
    Type: Application
    Filed: April 4, 2002
    Publication date: August 15, 2002
    Applicant: NIPPON SANSO CORPORATION
    Inventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
  • Publication number: 20020111747
    Abstract: The present invention provides an analysis system and analysis method for constantly monitoring gases, characterized in that in case there occurs a data discrepancy in an analyzer, the constant and continuous monitoring condition can be backed up while examining the cause of the problem can be carried out at the same time.
    Type: Application
    Filed: January 29, 2002
    Publication date: August 15, 2002
    Inventors: Akira Nishina, Tsutomu Kikuchi, Tetsuya Kimijima
  • Patent number: 6418781
    Abstract: An analyzing apparatus for assaying various kinds of trace impurity contents in various kinds of high-purity gases, having an atmospheric pressure ionization mass spectrometer useful for determination of trace impurity contents in such high-purity gases on the ppb to sub ppb levels and a gas chromatograph integrated therewith, enabling high efficiency determination of trace impurity contents in high-purity gases. The analyzing apparatus having a gas chromatograph (8) and an atmospheric pressure ionization mass spectrometer (6), is provided with a system (10) for introducing a sample gas introduced from a sample gas introduction source directly to the atmospheric pressure ionization mass spectrometer (6); a system (14a, 14b) for introducing the sample gas via the gas chromatograph (8) to the atmospheric pressure ionization mass spectrometer (6); and a channel selector (11, 13, 15) for changing over the channel of the sample gas to either of these two systems.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: July 16, 2002
    Assignee: Nippon Sanso Corporation
    Inventors: Akira Nishina, Tsutomu Kikuchi, Makoto Tanaka, Hidetoshi Yoshida, Tetsuya Kimijima
  • Patent number: 6397660
    Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: June 4, 2002
    Assignee: Nippon Sanso Corporation
    Inventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
  • Publication number: 20020062680
    Abstract: There is provided a gas analyzing apparatus capable of minimizing gas remaining by integrating gas switching apparatuses into one and capable of analyzing impurities of ppb level to sub-ppb level contained in various kinds of high-purity gases efficiently and accurately.
    Type: Application
    Filed: January 31, 2001
    Publication date: May 30, 2002
    Applicant: Nippon Sanso Corporation
    Inventors: Tsutomu Kikuchi, Akira Nishina, Tetsuya Kimijima
  • Patent number: 6375911
    Abstract: A process and an apparatus for treating an exhaust gas, in which a raw gas and high-boiling intermediate products contained in the exhaust gas let out from a CVD system employing a silicon-containing gas is brought into contact with a transition metal such as nickel or a silicide of such transition metals to decompose or convert them into stable halides, followed by detoxication treatment of the harmful components contained in the exhaust gas.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: April 23, 2002
    Assignee: Nippon Sanso Corporation
    Inventors: Tadahiro Ohmi, Yoshio Ishihara, Koh Matsumoto, Tetsuya Kimijima