Abstract: Use an ellipsoidal mirror that matches the wavelength of soft X-ray and thereby improves light-focusing efficiency, to increase the energy density of soft X-ray and process and/or refine works made of inorganic materials, etc., at an accuracy of several nm by using only soft X-ray, without irradiation with both patterned soft X-ray (patterned beam) and processing laser light. Focus soft X-ray 14 emitted from a light source part 7 to high energy density using an ellipsoidal mirror 15 and irradiate a work 19 with the focused light in a specified pattern in order to process only the area of the work 19 that has been irradiated with soft X-ray 14 in the specified pattern.

Abstract: Discloses a photo machining apparatus and a photo-fabrication method to perform two-dimensional or three-dimensional fabrication of an inorganic transparent material with a precision of 10 nm. Soft X-ray (2) emitted from a soft X-ray source (1) is focally applied by an optical system 3 comprising a combination of a concave mirror and convex mirrors onto an inorganic transparent material (4) in a predetermined pattern to generate new absorption in a irradiated region of the inorganic transparent material, which is then irradiated with a machining laser beam (5) so that a visible or ultraviolet machining laser beam (5) having a high energy density is absorbed exclusively in the part of the patterned inorganic transparent material (4) to fabricate the inorganic transparent material (4).

Abstract: Discloses a photo machining apparatus and a photo-fabrication method to perform two-dimensional or three-dimensional fabrication of an inorganic transparent material with a precision of 10 nm. Soft X-ray (2) emitted from a soft X-ray source (1) is focally applied by an optical system 3 comprising a combination of a concave mirror and convex mirrors onto an inorganic transparent material (4) in a predetermined pattern to generate new absorption in a irradiated region of the inorganic transparent material, which is then irradiated with a machining laser beam (5) so that a visible or ultraviolet machining laser beam (5) having a high energy density is absorbed exclusively in the part of the patterned inorganic transparent material (4) to fabricate the inorganic transparent material (4).