Patents by Inventor Tetsuya Sada

Tetsuya Sada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140353505
    Abstract: Disclosed is an apparatus for appropriately inspecting a defect on at least one of organic layers stacked on a substrate in an organic light emitting diode. The apparatus includes: an illumination unit configured to irradiate a near infrared light of a wavelength ranging from 0.7 ?m to 2.5 ?m toward the at least one of the organic layers on a glass substrate; an imaging unit configured to image the at least one of the organic layers irradiated with the near infrared light illuminated from the illumination unit; and a processing container configured to accommodate the illumination unit and the imaging unit therein and perform inspection of the at least one of the organic layers. An inside of the processing container is maintained in an atmosphere at an oxygen concentration lower than an oxygen concentration of air and at a dew point temperature lower than a dew point temperature of air.
    Type: Application
    Filed: May 27, 2014
    Publication date: December 4, 2014
    Applicants: Tokyo Electron Limited, Seiko Epson Corporation
    Inventors: Tetsuya Sada, Jun Nishiyama, Yu Konta, Kiyomi Oshima, Hiromi Saito, Shuichi Takei
  • Patent number: 6889764
    Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.
    Type: Grant
    Filed: March 8, 2001
    Date of Patent: May 10, 2005
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
  • Patent number: 6565656
    Abstract: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing a substrate, a spin chuck for rotating the substrate in the rotating cup, a lid body having an opening and attached to the rotating cup, a resist solution discharge nozzle for discharging a resist solution onto the substrate through the opening of the lid body, a small lid for blocking up the opening of the lid body, and a protrusion member provided on the underneath surface of the small lid to be positioned inside the rotating cup when the small lid is attached into the opening of the lid body. Thus, adjustment of a film thickness of a coating film after a coating solution is coated can be effectively performed.
    Type: Grant
    Filed: December 15, 2000
    Date of Patent: May 20, 2003
    Assignee: Toyko Electron Limited
    Inventors: Tetsuya Sada, Hiroshi Hashimoto, Yuji Shimomura
  • Patent number: 6456480
    Abstract: The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized. In addition, the processing apparatus comprises three or more of proximity pins, which form gap between the bottom of the substrate on the base and the top of the base to prevent a frictional electricity being formed therein.
    Type: Grant
    Filed: August 11, 1999
    Date of Patent: September 24, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Osamu Hirose, Tetsuya Sada
  • Patent number: 6391110
    Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: May 21, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Tetsuya Sada, Kiyohisa Tateyama
  • Publication number: 20010017035
    Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.
    Type: Application
    Filed: March 8, 2001
    Publication date: August 30, 2001
    Inventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
  • Publication number: 20010003965
    Abstract: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing a substrate, a spin chuck for rotating the substrate in the rotating cup, a lid body having an opening and attached to the rotating cup, a resist solution discharge nozzle for discharging a resist solution onto the substrate through the opening of the lid body, a small lid for blocking up the opening of the lid body, and a protrusion member provided on the underneath surface of the small lid to be positioned inside the rotating cup when the small lid is attached into the opening of the lid body. Thus, adjustment of a film thickness of a coating film after a coating solution is coated can be effectively performed.
    Type: Application
    Filed: December 15, 2000
    Publication date: June 21, 2001
    Inventors: Tetsuya Sada, Hiroshi Hashimoto, Yuji Shimomura
  • Patent number: 6238511
    Abstract: A method of processing a substrate for removing a coating film from a substrate by dissolving the coating film with a solvent, comprising the steps of (a) supplying a solvent independently to each of peripheral portions of an upper surface side and a lower surface side of the substrate, and (b) supplying the solvent to the peripheral portion of the lower surface side of the substrate in an amount lower than the solvent supplied to the peripheral portion of the lower surface side in the step (a) or lower than that supplied to the peripheral portion of the upper surface side in this step (b), or terminating a supply of the solvent.
    Type: Grant
    Filed: August 26, 1998
    Date of Patent: May 29, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuya Sada, Tetsu Kawasaki, Mitsuhiro Sakai, Takeshi Tsukamoto
  • Patent number: 6216475
    Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.
    Type: Grant
    Filed: July 22, 1999
    Date of Patent: April 17, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
  • Patent number: 6159288
    Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.
    Type: Grant
    Filed: September 23, 1997
    Date of Patent: December 12, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Kimio Motoda, Yoshitaka Matsuda, Tetsuya Sada, Kiyohisa Tateyama
  • Patent number: 6129546
    Abstract: Pins that are small protrusions are disposed on the upper surface of a heat process board. Through-holes are formed between the pins so as to deaerate from a space thereof. In a predetermined time period in the initial stage of the heat process, a deaerating process is performed using the through-holes. Thus, a negative pressure is applied to the space between the lower surface of the substrate and the upper surface of the heat process board so as to contact the substrate and the heat process board. Thereafter, the vacuum degree is lowered. Due to the rigidity of the substrate, the substrate and the heat process board are separated. In the initial stage of the heat process, since the substrate and the heat process board directly contact, the temperature of the substrate quickly and equally rises. In addition, when the heat shrinkage is large, since the substrate and the heat process board are separated, static electricity due to friction hardly takes place. Thus, a static breakdown can be prevented.
    Type: Grant
    Filed: June 22, 1999
    Date of Patent: October 10, 2000
    Assignee: Tokyo Electron Limited
    Inventor: Tetsuya Sada
  • Patent number: 6062240
    Abstract: A treatment device comprising a holding method for holding a substrate such as an LCD substrate; and a treatment solution supply method for supplying a treatment solution on a surface of the substrate wherein the holding method has a substrate-placing portion on which the substrate is disposed, the substrate-placing is made of a synthetic resinous material. Since the holding method has a substrate-placing portion which is made of a synthetic resinous material, the electric charge amount of the substrate can be reduced to prevent various static electricity caused troubles such as the electrostatic destruction of the device formed on the substrate. Further, a discharge noise trouble due to discharge phenomenon from the substrate to a transporting method can be prevented. Further, it is possible to reduce the electric charge amount of the holding method and destaticize the holding method by supplying a destaticizing fluid such as ionized pure water or ionized gas towards above or below the holding method.
    Type: Grant
    Filed: March 6, 1998
    Date of Patent: May 16, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuya Sada, Norio Uchihira, Mitsuhiro Sakai, Kiyomitsu Yamaguchi
  • Patent number: 6002572
    Abstract: The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized.
    Type: Grant
    Filed: March 24, 1998
    Date of Patent: December 14, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Osamu Hirose, Tetsuya Sada
  • Patent number: 5941083
    Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.
    Type: Grant
    Filed: January 18, 1996
    Date of Patent: August 24, 1999
    Assignee: Tokyo Electron Limited
    Inventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama