Patents by Inventor Tetsuya Sada
Tetsuya Sada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140353505Abstract: Disclosed is an apparatus for appropriately inspecting a defect on at least one of organic layers stacked on a substrate in an organic light emitting diode. The apparatus includes: an illumination unit configured to irradiate a near infrared light of a wavelength ranging from 0.7 ?m to 2.5 ?m toward the at least one of the organic layers on a glass substrate; an imaging unit configured to image the at least one of the organic layers irradiated with the near infrared light illuminated from the illumination unit; and a processing container configured to accommodate the illumination unit and the imaging unit therein and perform inspection of the at least one of the organic layers. An inside of the processing container is maintained in an atmosphere at an oxygen concentration lower than an oxygen concentration of air and at a dew point temperature lower than a dew point temperature of air.Type: ApplicationFiled: May 27, 2014Publication date: December 4, 2014Applicants: Tokyo Electron Limited, Seiko Epson CorporationInventors: Tetsuya Sada, Jun Nishiyama, Yu Konta, Kiyomi Oshima, Hiromi Saito, Shuichi Takei
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Patent number: 6889764Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.Type: GrantFiled: March 8, 2001Date of Patent: May 10, 2005Assignee: Tokyo Electron LimitedInventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
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Patent number: 6565656Abstract: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing a substrate, a spin chuck for rotating the substrate in the rotating cup, a lid body having an opening and attached to the rotating cup, a resist solution discharge nozzle for discharging a resist solution onto the substrate through the opening of the lid body, a small lid for blocking up the opening of the lid body, and a protrusion member provided on the underneath surface of the small lid to be positioned inside the rotating cup when the small lid is attached into the opening of the lid body. Thus, adjustment of a film thickness of a coating film after a coating solution is coated can be effectively performed.Type: GrantFiled: December 15, 2000Date of Patent: May 20, 2003Assignee: Toyko Electron LimitedInventors: Tetsuya Sada, Hiroshi Hashimoto, Yuji Shimomura
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Patent number: 6456480Abstract: The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized. In addition, the processing apparatus comprises three or more of proximity pins, which form gap between the bottom of the substrate on the base and the top of the base to prevent a frictional electricity being formed therein.Type: GrantFiled: August 11, 1999Date of Patent: September 24, 2002Assignee: Tokyo Electron LimitedInventors: Osamu Hirose, Tetsuya Sada
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Patent number: 6391110Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.Type: GrantFiled: October 12, 2000Date of Patent: May 21, 2002Assignee: Tokyo Electron LimitedInventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Tetsuya Sada, Kiyohisa Tateyama
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Publication number: 20010017035Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.Type: ApplicationFiled: March 8, 2001Publication date: August 30, 2001Inventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
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Publication number: 20010003965Abstract: A coating processing apparatus is structured by a rotating cup having an opening portion on the top thereof for housing a substrate, a spin chuck for rotating the substrate in the rotating cup, a lid body having an opening and attached to the rotating cup, a resist solution discharge nozzle for discharging a resist solution onto the substrate through the opening of the lid body, a small lid for blocking up the opening of the lid body, and a protrusion member provided on the underneath surface of the small lid to be positioned inside the rotating cup when the small lid is attached into the opening of the lid body. Thus, adjustment of a film thickness of a coating film after a coating solution is coated can be effectively performed.Type: ApplicationFiled: December 15, 2000Publication date: June 21, 2001Inventors: Tetsuya Sada, Hiroshi Hashimoto, Yuji Shimomura
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Patent number: 6238511Abstract: A method of processing a substrate for removing a coating film from a substrate by dissolving the coating film with a solvent, comprising the steps of (a) supplying a solvent independently to each of peripheral portions of an upper surface side and a lower surface side of the substrate, and (b) supplying the solvent to the peripheral portion of the lower surface side of the substrate in an amount lower than the solvent supplied to the peripheral portion of the lower surface side in the step (a) or lower than that supplied to the peripheral portion of the upper surface side in this step (b), or terminating a supply of the solvent.Type: GrantFiled: August 26, 1998Date of Patent: May 29, 2001Assignee: Tokyo Electron LimitedInventors: Tetsuya Sada, Tetsu Kawasaki, Mitsuhiro Sakai, Takeshi Tsukamoto
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Patent number: 6216475Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.Type: GrantFiled: July 22, 1999Date of Patent: April 17, 2001Assignee: Tokyo Electron LimitedInventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama
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Patent number: 6159288Abstract: An apparatus for a treatment is provided, the apparatus comprising a vessel for recovering a treatment liquid flowing out or flying out when the object is treated, cleaning means for cleaning an inner wall surface of the vessel by supplying a cleaning liquid into the vessel, and a circulation system for recovering a discharged liquid discharged from the vessel when the inner wall surface of the vessel is cleaned by the cleaning means and supplying the recovered liquid to the cleaning means.Type: GrantFiled: September 23, 1997Date of Patent: December 12, 2000Assignee: Tokyo Electron LimitedInventors: Fumio Satou, Mitsuhiro Sakai, Takeshi Tsukamoto, Yoichi Honda, Kiyomitsu Yamaguchi, Kimio Motoda, Yoshitaka Matsuda, Tetsuya Sada, Kiyohisa Tateyama
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Patent number: 6129546Abstract: Pins that are small protrusions are disposed on the upper surface of a heat process board. Through-holes are formed between the pins so as to deaerate from a space thereof. In a predetermined time period in the initial stage of the heat process, a deaerating process is performed using the through-holes. Thus, a negative pressure is applied to the space between the lower surface of the substrate and the upper surface of the heat process board so as to contact the substrate and the heat process board. Thereafter, the vacuum degree is lowered. Due to the rigidity of the substrate, the substrate and the heat process board are separated. In the initial stage of the heat process, since the substrate and the heat process board directly contact, the temperature of the substrate quickly and equally rises. In addition, when the heat shrinkage is large, since the substrate and the heat process board are separated, static electricity due to friction hardly takes place. Thus, a static breakdown can be prevented.Type: GrantFiled: June 22, 1999Date of Patent: October 10, 2000Assignee: Tokyo Electron LimitedInventor: Tetsuya Sada
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Patent number: 6062240Abstract: A treatment device comprising a holding method for holding a substrate such as an LCD substrate; and a treatment solution supply method for supplying a treatment solution on a surface of the substrate wherein the holding method has a substrate-placing portion on which the substrate is disposed, the substrate-placing is made of a synthetic resinous material. Since the holding method has a substrate-placing portion which is made of a synthetic resinous material, the electric charge amount of the substrate can be reduced to prevent various static electricity caused troubles such as the electrostatic destruction of the device formed on the substrate. Further, a discharge noise trouble due to discharge phenomenon from the substrate to a transporting method can be prevented. Further, it is possible to reduce the electric charge amount of the holding method and destaticize the holding method by supplying a destaticizing fluid such as ionized pure water or ionized gas towards above or below the holding method.Type: GrantFiled: March 6, 1998Date of Patent: May 16, 2000Assignee: Tokyo Electron LimitedInventors: Tetsuya Sada, Norio Uchihira, Mitsuhiro Sakai, Kiyomitsu Yamaguchi
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Patent number: 6002572Abstract: The processing apparatus prevents difficulty in separation of the substrate from the base because of charges on the substrate when the substrate is lifted from the base for substrate placing during processing. The processing apparatus comprises pins to lift up the substrate on the base and a neutralization apparatus to discharge ionized gas to the gap between the bottom of the substrate lifted from the base by the pins and the top of the base. When ionized gas is discharged to the substrate and the base, the charges are neutralized.Type: GrantFiled: March 24, 1998Date of Patent: December 14, 1999Assignee: Tokyo Electron LimitedInventors: Osamu Hirose, Tetsuya Sada
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Patent number: 5941083Abstract: A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.Type: GrantFiled: January 18, 1996Date of Patent: August 24, 1999Assignee: Tokyo Electron LimitedInventors: Tetsuya Sada, Osamu Hirose, Kiyohisa Tateyama