Patent number: 9244353
Abstract: A resist underlayer film forming composition including: a polymer having any one or more repeating structural units of Formulas (1a), (1b), and (1c): two R1s are each independently alkyl group, alkenyl group, aromatic hydrocarbon group, halogen atom, nitro group, or an amino group, two R2s are each independently hydrogen atom, alkyl group, alkenyl group, acetal group, acyl group, or glycidyl group, R3 is aromatic hydrocarbon group optionally having a substituent, R4 is hydrogen atom, phenyl group, or naphthyl group, in (1b), groups of two R3s and atoms or groups of two R4s are optionally different from each other, two “k”s are each independently 0 or 1, m is integer of 3 to 500, n, n1, and n2 are an integer of 2 to 500, p is integer of 3 to 500, X is a single bond or hetero atom, and two Qs are each independently a structural unit; and solvent.
Type:
Grant
Filed:
August 5, 2013
Date of Patent:
January 26, 2016
Assignee:
NISSAN CHEMICAL INDUSTRIES, LTD.
Inventors:
Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Takafumi Endo, Rikimaru Sakamoto