Patents by Inventor Tetsuya Utano

Tetsuya Utano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140034712
    Abstract: In wire bonding in which a bonding tool is cleaned through plasma irradiation, the plasma application to a wire and therefore the formation of an unexpectedly large-sized ball in the following bonding operation is prevented. The cleaning of the bonding tool through plasma irradiation is followed by dummy bonding, the bonding tool is cleaned with a ball formed thereon, or a prohibition period is provided during which ball forming is prohibited until the energy of plasma attenuates after the bonding tool is cleaned to prevent the plasma irradiation from having an impact on the bonding operation so that the ball cannot have an increased diameter.
    Type: Application
    Filed: October 4, 2013
    Publication date: February 6, 2014
    Applicant: Shinkawa Ltd.
    Inventors: Toru Maeda, Tetsuya Utano
  • Publication number: 20130240146
    Abstract: [Object] To provide a plasma apparatus capable of igniting plasma reliably over a long period. [Solution] The apparatus includes a hollow structural body (11) having a hollow structure along an axis, a first electrode (12) disposed inside the hollow structural body (11), and a second electrode (14) having a structure that externally covers a plasma generation area (13) of the hollow structural body (11). The first electrode (12) has a deformation structure (12b) within the plasma generation area of the hollow structural body.
    Type: Application
    Filed: May 8, 2013
    Publication date: September 19, 2013
    Applicant: Shinkawa Ltd.
    Inventors: Tetsuya Utano, Yuichiro Noguchi
  • Publication number: 20120280618
    Abstract: Provided is a plasma ignition technique allowing easy and reliable ignition and reignition of plasma without monitoring or manual handling. A plasma ignition system according to this technique is provided with a radio-frequency power supply configured to supply a predetermined high frequency signal to an applied electrode for generating plasma; a matching device configured to match impedance on a side of the radio-frequency power supply and impedance on a side of the applied electrode; a forward wave/reflected wave detector configured to detect a forward wave and a reflected wave of the high frequency signal; a high-voltage generator configured to generate a predetermined high voltage; and a controller configured to superimpose the high voltage on the high frequency signal when a ratio of the reflected wave to the forward wave is greater than a first threshold value.
    Type: Application
    Filed: June 7, 2012
    Publication date: November 8, 2012
    Applicant: Shinkawa Ltd.
    Inventors: Tetsuya Utano, Toru Maeda, Jun'ichi Takahira, Masanori Hamajima
  • Patent number: 7975901
    Abstract: A bonding apparatus including a chamber for maintaining an inert gas atmosphere; a first plasma torch for performing a surface treatment on pads and electrodes, the first plasma torch being attached in the chamber, to apply gas plasma to a substrate and a semiconductor chip that is placed inside the chamber; a second plasma torch for performing a surface treatment on an initial ball and/or wire at a tip end of a capillary that is positioned inside the chamber, the second plasma torch being attached in the chamber, to apply gas plasma to the initial ball and/or wire; and a bonding unit for bonding the surface-treated initial ball and/or wire to the surface-treated pads and electrodes in the chamber, thereby cleaning of the surface of the electrodes and pads as well as the wire can be effectively performed.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: July 12, 2011
    Assignees: Shinkawa Ltd., Tohoku University
    Inventors: Toru Maeda, Tetsuya Utano, Akinobu Teramoto
  • Publication number: 20100294435
    Abstract: A bonding apparatus including a chamber for maintaining an inert gas atmosphere; a first plasma torch for performing a surface treatment on pads and electrodes, the first plasma torch being attached in the chamber, to apply gas plasma to a substrate and a semiconductor chip that is placed inside the chamber; a second plasma torch for performing a surface treatment on an initial ball and/or wire at a tip end of a capillary that is positioned inside the chamber, the second plasma torch being attached in the chamber, to apply gas plasma to the initial ball and/or wire; and a bonding unit for bonding the surface-treated initial ball and/or wire to the surface-treated pads and electrodes in the chamber, thereby cleaning of the surface of the electrodes and pads as well as the wire can be effectively performed.
    Type: Application
    Filed: June 7, 2010
    Publication date: November 25, 2010
    Applicants: SHINKAWA LTD., TOHOKU UNIVERSITY
    Inventors: Toru MAEDA, Tetsuya UTANO, Akinobu TERAMOTO
  • Publication number: 20080093416
    Abstract: A tip end portion and an outer surface of a capillary (or of a wedge tool) used in, for instance, a wire bonding apparatus and method, being covered by a diamond layer with a heating element attached to the outer surface thereof. The inside of the capillary is formed by alumina ceramics, having a tapered hole. The tip end of the capillary is formed by the diamond layer, and a face portion and an inner chamfer portion are formed at the tip end to make a wire heating portion. Heat is transferred from the heating element to the wire heating portion through a heat supply path formed by the diamond layer, and a bonding surface formed by a wire and a pad is heated.
    Type: Application
    Filed: June 15, 2007
    Publication date: April 24, 2008
    Inventors: Tetsuya Utano, Yutaka Kondo, Toru Maeda