Patents by Inventor Tetuo Kurisaki

Tetuo Kurisaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma etching method for aluminum-based films
    Patent number: 4341593
    Abstract: A plasma etching method includes placing a workpiece including an aluminum-based film with an exposed portion on a cathode arranged in opposition to an anode. A plasma generating gas consisting of carbon tetrachloride and chlorine is introduced between the cathode and the anode at a pressure of 0.1 Torr or less. The ratio of the partial pressure of the chlorine to the total pressure of the plasma generating gas is 0.8 or less. Then, a high frequency electric power is applied between the cathode and the anode to generate a plasma from the plasma generating gas. The exposed portion of the aluminum-based film is etched by the plasma thus generated.
    Type: Grant
    Filed: August 14, 1980
    Date of Patent: July 27, 1982
    Assignees: Tokuda Seisakusyo, Ltd., Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Tetuo Kurisaki, Yasuhiro Horiike, Takashi Yamazaki