Patents by Inventor Tetuo Nishikawa

Tetuo Nishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4530582
    Abstract: An exposure aperture frame defining an exposure aperture includes at least a pivotable partition member with an inclined guide surface on the inner wall thereof which is pivoted by and thereby permits advancement of a film leader to a film take-up chamber so that the film leader can reach a film take-up chamber without any standstill within the exposure aperture frame. The inclined guide surface permits the forward end of the film leader to ride across the partition member. A spring urges the partition member toward a position in which it encloses the exposure aperture frame. That spring also releasably retains the partition member on a shaft on which it is pivoted. The partition member has a platform member extending toward the take-up chamber, which has an opening therethrough that provides access to the spring.
    Type: Grant
    Filed: September 29, 1983
    Date of Patent: July 23, 1985
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Hara, Takashi Tobioka, Takeshi Yoshino, Tetuo Nishikawa, Jiro Sekine