Patents by Inventor Tetuo Shimizu

Tetuo Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6054083
    Abstract: A preparation process in which PTFE coarse particles are finely pulverized into particles in wet state, thus enabling the finely pulverized particles to be washed as they are and an amount of impurities to be decreased efficiently and after the washing, agglomeration granulation is carried out, thus enabling PTFE molding powder to be obtained in the reduced number of steps; a preparation process of a polytetrafluoroethylene molding powder, characterized in that polytetrafluoroethylene coarse particles obtained by suspension polymerization of tetrafluoroethylene are finely pulverized, in wet state, into an average particle size particularly in a range of 10 to 100 .mu.m and then washed; and a preparation process of a polytetrafluoroethylene molding powder, characterized in that after the washing, mechanical force is applied to the washed powder in wet state for agglomeration granulation, thus giving particles having an average particle size in a range of 200 to 800 .mu.m.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: April 25, 2000
    Assignee: Daikin Industries, Ltd.
    Inventors: Michio Asano, Singo Tanigawa, Akira Shimodoh, Tetuo Shimizu, Shiouji Kawachi
  • Patent number: 5810928
    Abstract: A method of measuring gas component Concentrations of special material gases for semiconductor, and a semiconductor equipment are provided. The method and apparatus can be incorporated in a gas pipe line system in an inline manner, and measure the component and concentration of a gas flowing through a gas pipe line or a gas with which the gas pipe line system is filled, thereby eliminating any erroneous connection. In the method of measuring gas component concentrations of special material gases for semiconductor, as means for attaining the objects, an infrared gas detector is disposed in a gas pipe line between a gas cylinder containing a special material gas for semiconductor and a semiconductor producing section, so that the gas component and concentration are measured in an inline manner. An apparatus for supplying special material gases for semiconductor is also provided.
    Type: Grant
    Filed: November 16, 1995
    Date of Patent: September 22, 1998
    Assignees: Mitsubishi Corporation, Horiba Co. Ltd., Stec, Inc.
    Inventors: Hiroyuki Harada, Toshihiko Uno, Shigeyuki Akiyama, Tetuo Shimizu