Patents by Inventor Teturyo Kusunoki

Teturyo Kusunoki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive resist composition
    Patent number: 5912102
    Abstract: A positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent composed of a quinonediazide sulfonate of a specific polyhydroxy compound, and an aromatic compound having at least one phenolic hydroxyl group.
    Type: Grant
    Filed: June 26, 1997
    Date of Patent: June 15, 1999
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Shoji Kawata, Motofumi Kashiwagi, Teturyo Kusunoki, Masahiro Nakamura
  • Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive
    Patent number: 5376497
    Abstract: Disclosed herein is a positive resist composition comprising in admixture:(a) 100 parts by weight of an alkali-soluble phenolic resin;(b) 1-100 parts by weight of a photosensitive agent formed of a quinonediazide sulfonic acid ester;(c) 1-100 parts by weight of a hydroxy compound having a structure that at least part of its hydroxyl group(s) (--OH) has been modified by at least one conversion reaction selected from the group consisting of esterification with sulfonic acid (--OSO.sub.2 R), esterification with carboxylic acid (--OCOR) and etherification (--O--R), in which R means an alkyl, substituted alkyl, alkenyl, substituted alkenyl, aryl, substituted aryl, aralkyl or substituted aralkyl group; and(d) sufficient solvent to dissolve the foregoing composition components.
    Type: Grant
    Filed: April 22, 1992
    Date of Patent: December 27, 1994
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Shoji Kawata, Toshiaki Fujii, Teturyo Kusunoki, Motofumi Kashiwagi, Hiroshi Yagi, Kazuko Koito, Shinya Ikeda