Abstract: An arrangement for coating substrates in an apparatus for vacuum deposition comprises a rotatable substrate holding structure in the form of a circular plate provided with holders for the substrates. The holders are arranged in circular rows around the axis of rotation of the plate so that the substrates held in the holder are arranged at axes such that those substrates in a single circular row have axes which intersect a single point along the axis of rotation of the plate. A vapor beam correction screen is mounted for rotation adjacent to the plate in an opposite direction about the same axis. A vapor beam correction screen is conformed in a stepwise manner to an even coating of spherical zones which have their center of curvature at the point of intersection of the substrate axes and are tangent to the poles of the respective substrates and cover the surface areas thereof.

Abstract: Surfaces of revolution to be coated by vapor deposition are placed in centering holes of a rotary dome which is centrally seated on a rotary ring. The rotary ring centered by means of fixedly mounted guide and drive rollers so as to have an evaporative source located as close as possible to the axis of rotation of the dome and at the center of curvature of the dome. The substance, vaporized by heating in a high vacuum space, condenses on the substrates as a thin layer. From the variation of the layer thickness, the outline of a corrective mask is computed for a constant radiant intensity of the vapor in all utilizable directions in the space, while assuming a central, point source of evaporation. A corresponding corrective mask is then secured by means of a support to another rotary ring in close proximity to the surfaces of revolution to be coated, which other ring is centered in the same manner as the first rotary ring, but rotates in the opposite direction about the same axis.

Abstract: The vacuum evaporation apparatus comprises a housing having walls defining n evacuable evaporation chamber with an evaporator in the chamber disposed below a supporting structure for the substance to be coated and including an annular screen disposed around the evaporator between the evaporator and the walls of the housing so that only an opening or angle between the evaporator and the supporting structure is left which is sufficient for the vapor deposition of the substrates. The screen is of a material which may be heated, such as a metal material, which may be electrically heated.

Abstract: A method of producing a high vacuum in a vacuum container which has an exst connection line connected thereto and using an interior protective covering for the walls of the container and a protective gas comprises, applying covering to the interior of the container so as to shield the inner walls thereof and to also shield the exhaust connection thereto, directing a protective gas into the space between the covering the interior walls of the container, preferably during the flooding in which the container is opened, and thereafter evacuating the interior of the container through the exhaust connection and heating the covering. The vacuum treatment device, such as a device for evaporating materials from vapor deposition, comprises a closed container having interior walls with a thin-walled metal sheet forming a covering arranged in spaced relationship to the interior walls so as to shield a major area of the walls and to define a space between the walls and the covering.

Abstract: A method of producing a high vacuum in a container which has limiting walls hich define a reaction chamber which is adapted to be evacuated for vacuum processing purposes, and in which gases are sorbed during vacuum operation and the gases are removed subsequently by increasing the temperature of the walls and evacuating the chamber at the same time includes heating the reaction chamber, sensing the underpressure in the reaction chamber and controlling the heating of the chamber in accordance with the sensed pressure in a manner such that the underpressure remains within a preselected upper and lower limit value until a predetermined temperature of the walls is attained.

Abstract: A method for determining the quantity ratio of two components of a multi-substance mixture whose absorption bands are adjacent to each other and overlap comprises using an interference filter which is rotated in a uniform rotation about a first axis through the filter plane which forms with a perpendicular erected on the filter plane a fixed angle .beta. which is not equal to zero. The filter is rotatably arranged about a second axis through the filter plane and the method is characterized by adjusting the angle .alpha. which the axis of rotation forms with the ray in the range of .beta. is less than .alpha. so that a signal corresponding to the first derivative of the spectral intensity distribution of the radiation transmitted by the substance mixture just passes through zero and a quantity correlated with this angle is used as a measure of the quantity ratio.

Abstract: A pump for the treatment of gases with a sorbent material in an evacuated chamber comprises a housing which has a plurality of stacked plates which define a continuous upwardly extending path for the sorbent material which is made up of successive spirals. At least some of the spirals are spaced vertically apart to define a sorption zone permitting the passage of gases to be treated over the sorbent material. In addition the stacked plates also define a closed path in the housing leading from the sorption zone and out of the housing for discharing desorbed gases. The housing is vibrated by a vibration drive applied to effect upward movement of the sorbent material and a downcomer pipe or return pipe extends through the plates for returning the sorbent material from the upper portion of the path back to the location of the bottom of the sorbent material path. The sorbent material is continuously moved upwardly through the housing on the plates by vibrating the housing to effect such movement.

Abstract: The concentration ratio of two components of a mixture of substances, having absorption bands which are adjacent each other in a manner such that the radiation absorption of the mixture of substances has a minimum between these absorption bands, is determined by measuring, in three adjacent, narrow spectral regions, of the radiation transmitted by the mixture of substances, a variable which is proportional to the ratio .DELTA..sup.1 I / .DELTA..sup.2 I wherein the numerator .DELTA..sup.1 I = (I.sub.3 - I.sub.1) is the difference between the intensities of radiation of the two outer spectral regions, and the denominator .DELTA..sup.2 I = (I.sub.3 - I.sub.2) -(I.sub.2 - I.sub.1) is the value by which the respective differences between the intensities of radiation of each outer spectral region and the middle spectral region differ from each other.

Abstract: A method and apparatus for enriching a gas of lower molecular weight with substances of higher molecular weight contained therein, comprises using first and second molecular pumps connected together, with the second pump having a conveying direction different from the first pump, and wherein a feed line for the gas terminates in a working chamber of the first molecular pump and its exhaust side includes extraction means for the enriching component. The gas is conducted to the working chamber of the first molecular pump and a portion of the gas is conveyed at the intake side of the molecular pump by means of the second pump. The substances of higher molecular weight are collected and extracted at the exhaust side of the first molecular pump.