Patents by Inventor Thaddeus M. Muzyczko

Thaddeus M. Muzyczko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4492012
    Abstract: A roll for use in a printing operation and a method of making same is disclosed. The roll includes a tubular mesh sleeve which is covered with an elastomer composition, such as a Buna-N rubber. The composition includes discrete fibers, such as nylon fibers, which are substantially uniformly dispersed in the composition. The sleeve is stretched over a metal mandrel and the composition, with the fibers therein, is extruded onto the sleeve to form a seamless covering which is vulcanized to the sleeve. The mandrel is removed and the sleeve with its vulcanized covering is then bonded to a metal core by a suitable adhesive, such as an epoxy adhesive, and the outer surface of the covering is ground to raise a nap of the fibers and cleaned to remove any foreign matter not anchored to the coating.
    Type: Grant
    Filed: January 13, 1982
    Date of Patent: January 8, 1985
    Assignee: Samuel Bingham Company
    Inventors: Jerome Pala, Yale Karmell, Thaddeus M. Muzyczko
  • Patent number: 4273851
    Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas.
    Type: Grant
    Filed: March 26, 1980
    Date of Patent: June 16, 1981
    Assignee: Richardson Graphics Company
    Inventors: Thaddeus M. Muzyczko, Daniel C. Thomas
  • Patent number: 4268608
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: May 25, 1979
    Date of Patent: May 19, 1981
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4225661
    Abstract: A photoreactive coating composition, particularly suited for use in a lithographic plate, is characterized by both reduced exposure time requirements and an intense visual image which is immediately produced upon exposure of the composition to light permitting visual inspection during imaging. The photoreactive composition has a diazo resin layer and an overlayer which includes a photochromic compound (e.g. an indolinobenzospiropyran compound) and a light sensitive polymer selected from the group cinnamoylated and acrylated photopolymer resins.
    Type: Grant
    Filed: May 10, 1978
    Date of Patent: September 30, 1980
    Assignee: The Richardson Company
    Inventor: Thaddeus M. Muzyczko
  • Patent number: 4224398
    Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-soluble polymer particulates, thus forming oleophilic image areas.
    Type: Grant
    Filed: May 29, 1979
    Date of Patent: September 23, 1980
    Assignee: Richardson Graphics Company
    Inventors: Thaddeus M. Muzyczko, Daniel C. Thomas
  • Patent number: 4186069
    Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas.
    Type: Grant
    Filed: January 30, 1978
    Date of Patent: January 29, 1980
    Assignee: Richardson Graphics Company
    Inventors: Thaddeus M. Muzyczko, Daniel C. Thomas
  • Patent number: 4156612
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: November 25, 1977
    Date of Patent: May 29, 1979
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4089789
    Abstract: As improved corrosion inhibitors, reaction products of alkylene oxides and blocked phenols wherein two substituents of the phenol are non-oxyalkylatable, saturated tertiary-amino alkylene groups, and acid-stable salts of these products.
    Type: Grant
    Filed: October 11, 1974
    Date of Patent: May 16, 1978
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Samuel Shore, Jerome A. Martin
  • Patent number: 4083724
    Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.
    Type: Grant
    Filed: August 4, 1975
    Date of Patent: April 11, 1978
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Donald W. Fieder
  • Patent number: 4077806
    Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.
    Type: Grant
    Filed: October 2, 1975
    Date of Patent: March 7, 1978
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Donald W. Fieder
  • Patent number: 4065314
    Abstract: A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##STR1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: July 12, 1976
    Date of Patent: December 27, 1977
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 4049746
    Abstract: Compositions comprising the reaction product of a novel, highly branched polyalkylenimine-urea-aldehyde resin and a polyacrylic resin provide useful intermediate coatings when applied to preconditioned metal surfaces which may be subsequently coated with light sensitive materials to make photolithographic plates. The intermediate coating, particularly when applied to a grained or ungrained aluminum support member which has been anodized and finally coated with light sensitive materials produces a highly durable plate that possesses good storage characteristics and is capable of unusually extended press runs.
    Type: Grant
    Filed: August 22, 1975
    Date of Patent: September 20, 1977
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Ronald A. Frederiksen, David L. York
  • Patent number: 4046577
    Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: July 12, 1976
    Date of Patent: September 6, 1977
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 3994826
    Abstract: A method of emulsification comprising of utilizing salts of water-soluble organic acids and phenols with at least one salt-forming aminoalkylene group. An illustrative salt which can be used is the reaction product of dodecylbenzene sulfonic acid and 2,6-Bis(dimethylaminomethylene)-4-methyl phenol. These salts in combination with non-ionic surfactants provide particularly useful emulsifying systems in salt water, hard water and bacteria-containing systems.
    Type: Grant
    Filed: November 27, 1974
    Date of Patent: November 30, 1976
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Jon A. Loboda
  • Patent number: 3969119
    Abstract: A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##EQU1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.
    Type: Grant
    Filed: June 9, 1975
    Date of Patent: July 13, 1976
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Thomas H. Jones
  • Patent number: 3930868
    Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##EQU1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to 10 carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.
    Type: Grant
    Filed: May 23, 1973
    Date of Patent: January 6, 1976
    Assignee: The Richardson Company
    Inventors: Thaddeus M. Muzyczko, Donald W. Fieder