Patents by Inventor Thaddeus M. Muzyczko
Thaddeus M. Muzyczko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 4492012Abstract: A roll for use in a printing operation and a method of making same is disclosed. The roll includes a tubular mesh sleeve which is covered with an elastomer composition, such as a Buna-N rubber. The composition includes discrete fibers, such as nylon fibers, which are substantially uniformly dispersed in the composition. The sleeve is stretched over a metal mandrel and the composition, with the fibers therein, is extruded onto the sleeve to form a seamless covering which is vulcanized to the sleeve. The mandrel is removed and the sleeve with its vulcanized covering is then bonded to a metal core by a suitable adhesive, such as an epoxy adhesive, and the outer surface of the covering is ground to raise a nap of the fibers and cleaned to remove any foreign matter not anchored to the coating.Type: GrantFiled: January 13, 1982Date of Patent: January 8, 1985Assignee: Samuel Bingham CompanyInventors: Jerome Pala, Yale Karmell, Thaddeus M. Muzyczko
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Patent number: 4273851Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas.Type: GrantFiled: March 26, 1980Date of Patent: June 16, 1981Assignee: Richardson Graphics CompanyInventors: Thaddeus M. Muzyczko, Daniel C. Thomas
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Patent number: 4268608Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.Type: GrantFiled: May 25, 1979Date of Patent: May 19, 1981Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Thomas H. Jones
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Patent number: 4225661Abstract: A photoreactive coating composition, particularly suited for use in a lithographic plate, is characterized by both reduced exposure time requirements and an intense visual image which is immediately produced upon exposure of the composition to light permitting visual inspection during imaging. The photoreactive composition has a diazo resin layer and an overlayer which includes a photochromic compound (e.g. an indolinobenzospiropyran compound) and a light sensitive polymer selected from the group cinnamoylated and acrylated photopolymer resins.Type: GrantFiled: May 10, 1978Date of Patent: September 30, 1980Assignee: The Richardson CompanyInventor: Thaddeus M. Muzyczko
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Patent number: 4224398Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-soluble polymer particulates, thus forming oleophilic image areas.Type: GrantFiled: May 29, 1979Date of Patent: September 23, 1980Assignee: Richardson Graphics CompanyInventors: Thaddeus M. Muzyczko, Daniel C. Thomas
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Patent number: 4186069Abstract: A photopolymerizable system is provided as a latex system that is an oil-in-water polymer emulsion including particulates of water-insoluble polymers in combination with a water-soluble or water-dispersible, light-sensitive polymer having multiple light-sensitive moieties. Prior to coating onto a substrate, the system is a three-phase precursor emulsion of the emulsion particulates, the water phase, and the light-sensitive polymer. After coating, the bulk of the water phase is evaporated off, leaving a two-phase system of the emulsion particulates surrounded by the light-sensitive polymer. When selected areas are subjected to actinic radiation, a water-insoluble matrix is formed, the matrix containing cross-linked light-sensitive polymer having dispersed therethrough and/or included therein the water-insoluble polymer particulates, thus forming oleophilic image areas.Type: GrantFiled: January 30, 1978Date of Patent: January 29, 1980Assignee: Richardson Graphics CompanyInventors: Thaddeus M. Muzyczko, Daniel C. Thomas
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Patent number: 4156612Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.Type: GrantFiled: November 25, 1977Date of Patent: May 29, 1979Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Thomas H. Jones
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Patent number: 4089789Abstract: As improved corrosion inhibitors, reaction products of alkylene oxides and blocked phenols wherein two substituents of the phenol are non-oxyalkylatable, saturated tertiary-amino alkylene groups, and acid-stable salts of these products.Type: GrantFiled: October 11, 1974Date of Patent: May 16, 1978Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Samuel Shore, Jerome A. Martin
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Patent number: 4083724Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.Type: GrantFiled: August 4, 1975Date of Patent: April 11, 1978Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Donald W. Fieder
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Patent number: 4077806Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##STR1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to ten carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.Type: GrantFiled: October 2, 1975Date of Patent: March 7, 1978Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Donald W. Fieder
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Patent number: 4065314Abstract: A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##STR1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.Type: GrantFiled: July 12, 1976Date of Patent: December 27, 1977Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Thomas H. Jones
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Patent number: 4049746Abstract: Compositions comprising the reaction product of a novel, highly branched polyalkylenimine-urea-aldehyde resin and a polyacrylic resin provide useful intermediate coatings when applied to preconditioned metal surfaces which may be subsequently coated with light sensitive materials to make photolithographic plates. The intermediate coating, particularly when applied to a grained or ungrained aluminum support member which has been anodized and finally coated with light sensitive materials produces a highly durable plate that possesses good storage characteristics and is capable of unusually extended press runs.Type: GrantFiled: August 22, 1975Date of Patent: September 20, 1977Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Ronald A. Frederiksen, David L. York
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Patent number: 4046577Abstract: A photoreactive composition containing an effective amount of a polymer which includes as a recurring structure: ##STR1## wherein Ar is a bivalent aromatic radical, and M is selected from the class consisting of hydrogen, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.Type: GrantFiled: July 12, 1976Date of Patent: September 6, 1977Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Thomas H. Jones
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Patent number: 3994826Abstract: A method of emulsification comprising of utilizing salts of water-soluble organic acids and phenols with at least one salt-forming aminoalkylene group. An illustrative salt which can be used is the reaction product of dodecylbenzene sulfonic acid and 2,6-Bis(dimethylaminomethylene)-4-methyl phenol. These salts in combination with non-ionic surfactants provide particularly useful emulsifying systems in salt water, hard water and bacteria-containing systems.Type: GrantFiled: November 27, 1974Date of Patent: November 30, 1976Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Jon A. Loboda
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Patent number: 3969119Abstract: A photoreactive composition containing an effective amount of a compound having at least two alkoxyaromaticglyoxy substituents per molecule, which substituents have the following general formula: ##EQU1## wherein R is selected from the class consisting of H, aryl, alkyl, halo and arakyl having up to 10 carbon atoms, n is an integer from 1 to 18, Ar is an aromatic substituent, and M is selected from the class consisting of H, alkali metal, ammonium, and substituted ammonium. These compositions are useful in a wide variety of photochemical and photomechanical processes and are particularly suited for use as photopolymers, photoinitiators and photosensitizers in light sensitive coatings of presensitized lithographic plates.Type: GrantFiled: June 9, 1975Date of Patent: July 13, 1976Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Thomas H. Jones
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Patent number: 3930868Abstract: A light-sensitive composition comprising novel arylglyoxyalkyl acrylates that exhibits useful light sensitivity. The basic structure of the new compositions, which may also themselves be polymerized are as follows: ##EQU1## wherein Ar represents an aromatic structure selected from the group consisting of benzene, naphthalene and substituted products of each, R.sub.1 represents an alkyl group having from one to ten carbon atoms, R.sub.2 represents a grouping selected from the group consisting of hydrogen, or a lower alkyl group having from one to five carbon atoms and R.sub.3 represents an alkenyl group having from one to 10 carbon atoms and singular unsaturation. The light-sensitive compositions may themselves be utilized in photochemistry as photopolymers, they may be combined with suitable solvents and additives or polymerized with suitable backbone polymers to provide substances which can be used as light-sensitive coatings.Type: GrantFiled: May 23, 1973Date of Patent: January 6, 1976Assignee: The Richardson CompanyInventors: Thaddeus M. Muzyczko, Donald W. Fieder