Patents by Inventor Thanh Pham
Thanh Pham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 6175622Abstract: A system and method for allowing a wireline or wireless carrier or service provider to transparently provide a virtual private network to wireless callers of the network. The method works in a telecommunications network including a service switch point, a service control point, and a first and second telephone. The method provides a virtual private network for the first and second telephone by performing a series of steps. First, an identifier for the first telephone is stored in a memory accessible by the service control point. Next, a first dialed number is received from the first telephone by the service switch point. The service switch point notifies the service control point to determine if the identifier for the first telephone is in the memory. If so, the service control point converts the number dialed by the first telephone to a second dialed number. The service control point then provides the second dialed number, being assigned to the second telephone, to the service switch point.Type: GrantFiled: February 10, 1998Date of Patent: January 16, 2001Assignee: Northern Telecom LimitedInventors: Sima Chiniwala, James B. Welling, Jr., Stewart Hodde Maxwell, Thanh Pham, Anatoly Vaserfirer
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Patent number: 6117244Abstract: A deposition resistant lining assembly is provided for a chemical vapor deposition chamber, the deposition resistant lining assembly including a first ceramic liner for mounting adjacent a substrate holder within the chemical vapor deposition chamber to protect a portion of an interior wall of the chemical vapor deposition chamber from deposition of material on the portion of said interior wall of the chemical vapor deposition chamber. The deposition resistant lining assembly also includes a second ceramic liner for mounting in a pumping channel formed in a peripheral region of the chemical vapor deposition chamber to protect a portion of said pumping channel from deposition of the material on the portion of the pumping channel. The first ceramic liner and the second ceramic liner are more resistant to deposition of the material than aluminum and easier and faster to clean of the material deposited thereon than aluminum.Type: GrantFiled: March 24, 1998Date of Patent: September 12, 2000Assignee: Applied Materials, Inc.Inventors: Won B. Bang, Ellie Yieh, Thanh Pham
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Patent number: 6110556Abstract: A chemical vapor deposition (CVD) system of the type having an enclosure housing a process chamber and a supply of cleaning gas, features a lid having a base plate with opposed first and second major surfaces and a plurality of throughways extending therebetween to provide an asymmetric flow of cleaning gas into the chamber. Specifically, a subportion of the second major surface lies in a plane of truncation and faces the process chamber when the lid is in a closed position. The remaining portions of the second major surface are recessed, defining central and annular recesses. The annular recess has a base surface and two spaced-apart side surfaces extending from the base surface and terminating proximate to the plane of truncation. The plurality of throughways consists of primary and secondary throughways, each of which extends from an opening in the first major surface and terminates in an orifice.Type: GrantFiled: October 17, 1997Date of Patent: August 29, 2000Assignee: Applied Materials, Inc.Inventors: Won Bang, Ellie Yieh, Thanh Pham
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Patent number: 6099694Abstract: The invention relates to an improvement in a process in which chlorine and difluoromethane are present in a distillation column, for example, a fluorination reaction. By controlling the chlorine feed such that the concentration of chlorine relative to difluoromethane in the distillation column is maintained below about 22 weight percent (the flammability threshold for chlorine in a mixture of difluoromethane and chlorine), formation of a flammable difluoromethane/chlorine mixture may be minimized or avoided. The invention is particularly useful in a process for the preparation of difluoromethane wherein at least one distillation column separates difluoromethane from unreacted starting materials such as methylene chloride, hydrogen fluoride and monochloromonofluoromethane.Type: GrantFiled: March 23, 1998Date of Patent: August 8, 2000Assignee: AlliedSignal Inc.Inventors: Hang Thanh Pham, Rajiv R. Singh, Addison M. Smith, David P. Wilson, Raymond Hilton Percival Thomas, Gustavo Cerri
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Patent number: 6100230Abstract: This invention provides compositions of 1,1,1,3,3-pentafluoropropane, water and at least one hydrocarbon selected from the group consisting of n-pentane, isopentane, cyclopentane and hexane that are environmentally desirable for use as refrigerants, aerosol propellants, metered dose inhalers, blowing agents for polymer foam, heat transfer media, and gaseous dielectrics.Type: GrantFiled: March 15, 1999Date of Patent: August 8, 2000Assignee: AlliedSignal Inc.Inventors: Leslie Bruce Bement, Mary Charlotte Bogdan, Peter Brian Logsdon, Hang Thanh Pham, Ronald Riegal, David John Williams, Kevin Donald Uhrich
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Patent number: 6060629Abstract: Provided are azeotropic and azeotrope-like mixtures of 1,1,1,3,3-pentafluoropropane (HFC-245fa) and hydrogen fluoride. Such are useful as an intermediate in the production of HFC-245fa. The latter is useful as a nontoxic, zero ozone depleting fluorocarbon useful as a solvent, blowing agent, refrigerant, cleaning agent, aerosol propellant, heat transfer medium, dielectric, fire extinguishing composition and power cycle working fluid.Type: GrantFiled: September 10, 1999Date of Patent: May 9, 2000Assignee: AlliedSignal Inc.Inventors: Hang Thanh Pham, Rajiv Ratna Singh, Ian Robert Shankland, Hsueh Sung Tung
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Patent number: 6047713Abstract: An improved method of in-situ cleaning a throttle valve in a CVD device and exhaust flow control apparatus for facilitating such cleaning. The throttle valve is repositioned such that it is juxtaposed in close proximity to the exhaust gas port of the reaction chamber. A plasma is then ignited in a cleaning gas mixture of nitrogen trifluoride, hexafluoroethane and oxygen.Type: GrantFiled: February 3, 1994Date of Patent: April 11, 2000Assignee: Applied Materials, Inc.Inventors: Stuardo A. Robles, Thanh Pham, Bang C. Nguyen
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Patent number: 6012600Abstract: A method and apparatus is provided which secures the lid of a processing chamber in abutting engagement with the walls of the chamber to form an airtight processing environment and which provides for the release of pressure within the chamber in the event of a sudden change in pressure such as an over pressure excursion. The method and apparatus generally comprise a clamp member having a base portion for mounting the clamp to a first surface, a contact portion for contacting a second surface and maintaining a desired relationship between the first and second surfaces, and a deflecting portion which allows separation of the first and second surfaces to relieve pressure behind the first or second surface and return to the desired relationship between the first and second surfaces.Type: GrantFiled: February 2, 1996Date of Patent: January 11, 2000Assignee: Applied Materials, Inc.Inventors: Thanh Pham, Eugene Fukshansky, David Wanamaker
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Patent number: 6001796Abstract: Provided are azeotropic and azeotrope-like mixtures of 1,1,1,3,3-pentafluoropropane (HFC-245fa) and hydrogen fluoride. Such are useful as an intermediate in the production of HFC-245fa. The latter is useful as a nontoxic, zero ozone depleting fluorocarbon useful as a solvent, blowing agent, refrigerant, cleaning agent, aerosol propellant, heat transfer medium, dielectric, fire extinguishing composition and power cycle working fluid.Type: GrantFiled: July 3, 1996Date of Patent: December 14, 1999Assignee: AlliedSignal Inc.Inventors: Hang Thanh Pham, Rajiv Ratna Singh, Ian Robert Shankland, Hsueh Sung Tung
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Patent number: 5968588Abstract: An apparatus for in-situ control of the flow of a liquid precursor into a deposition chamber comprises a liquid injection system having a liquid injection outlet connected to a chamber inlet line upstream of the deposition chamber. The liquid injection system includes a liquid precursor supply, a carrier gas supply, a vaporizer, and a controller managing flows of the liquid precursor and carrier gas to the chamber. A bypass line is connected to the chamber inlet line and includes a bypass valve, a sonic orifice, and a pressure gauge upstream of the sonic orifice. To calibrate the flow of the liquid precursor, a flow of carrier gas is directed into the bypass line at a carrier gas sonic flow rate. A first steady state pressure is measured with the pressure gauge. The liquid precursor is vaporized and directed to the flow of carrier gas into the bypass line. A second steady state pressure is measured with the pressure gauge.Type: GrantFiled: March 17, 1997Date of Patent: October 19, 1999Assignee: Applied Materials, Inc.Inventors: Visweswaren Sivaramakrishnan, Yen-Kun Wang, Fong Chang, Thanh Pham, Jeff Plante
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Patent number: 5948381Abstract: The invention provides a process for separating fluorinated organic compounds from mixtures of the such compounds and hydrogen fluoride. More particularly, the invention provides a method for separating a fluorinated organic compound from a mixture containing at least one fluorinated organic compound and hydrogen fluoride by adding an inorganic salt to the mixture.Type: GrantFiled: July 3, 1996Date of Patent: September 7, 1999Assignee: AlliedSignal Inc.Inventors: Richard Elmer Eibeck, Hang Thanh Pham, Valentine Theodore Zuba
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Patent number: 5922962Abstract: A two-dimensional ultrasonic transducer for forming images. The transducer has a plurality of transducer elements for producing ultrasonic bursts in a predetermined manner, and receiving reflected ultrasound from the subject under examination due to the ultrasonic bursts. The plurality of transducer elements are arranged in an array into columns and rows, the columns of the transducer elements arranged in a scanning plane for scanning the subject under examination in order to form a two-dimensional profile of the subject, and the rows of the transducer elements having groups of symmetrically arranged transducer elements being oriented in a elevational plane. Each of the groups of symmetrically arranged transducer elements are mechanically arranged to have a focus at specified locations distant from the transducer which is within the subject under examination.Type: GrantFiled: November 4, 1996Date of Patent: July 13, 1999Assignee: Diasonics Ultrasound, Inc.Inventors: Syed Omar Ishrak, Mehmet Salahi, Farhad Towfiq, Alan Chi-Chung Tai, Ha Thanh Pham
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Patent number: 5918481Abstract: The invention provides a method for separating fluorocarbons from mixtures of fluorocarbon and hydrogen fluoride. In particular, the invention provides a method for separating fluorocarbons, such as pentafluoropropane, from azeotropic mixtures of the fluorocarbon and hydrogen fluoride using compositional variations with pressure.Type: GrantFiled: November 20, 1997Date of Patent: July 6, 1999Assignee: AlliedSignal Inc.Inventors: Hang Thanh Pham, Rajiv Ratna Singh, Hsueh Sung Tung, Daniel Christopher Merkel, David Goldschmidt, Tadeusz Piotr Rygas
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Patent number: 5895639Abstract: The invention provides a process for the separation of azeotropic mixtures of fluorocarbons from hydrogen fluoride. The most preferred fluorocarbon for this invention is 1,1,1,3,3-pentafluoropropane, which is also known as HFC-245fa. The separation in conducted by adding sulfuric acid to the mixture while the mixture is in either the liquid or gaseous states.Type: GrantFiled: July 3, 1996Date of Patent: April 20, 1999Assignee: AlliedSignal Inc.Inventors: Charles Francis Swain, Rajiv Ratna Singh, Hang Thanh Pham
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Patent number: 5871813Abstract: The present invention provides an apparatus and methods for controlling gas pressure within a semiconductor process chamber. The apparatus comprises a fluid conduit, and a throttle valve positioned downstream of the process chamber outlet for controlling gas flow therethrough. A filter is disposed between the inlet of the fluid conduit and the throttle valve for collecting gas particles flowing through the fluid conduit to inhibit gas deposition on the throttle valve. In addition, the filter functions as a flow restrictor to reduce the gas flow rate through the fluid conduit. This allows the throttle valve to operate in a more open position for a particular desired gas pressure, which usually reduces the amount of throttle valve surfaces exposed to gas passing therethrough. Accordingly, the amount of gas deposited on these surfaces is further reduced. This configuration minimizes any friction between valve surfaces, which increases the lifetime of the throttle valve and the throughput of the process.Type: GrantFiled: March 5, 1997Date of Patent: February 16, 1999Assignee: Applied Materials, Inc.Inventor: Thanh Pham
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Patent number: 5866795Abstract: An apparatus for controlling the flow of a liquid precursor into a deposition chamber comprises a liquid injection system having a liquid injection outlet connected to a chamber inlet line upstream of the deposition chamber. The liquid injection system includes a liquid precursor supply, a purge gas supply, a carrier gas supply, a liquid flow meter, and a controller managing flows of the liquid precursor and carrier gas to the chamber. A purge line is connected between the purge gas supply and the liquid flow meter and is used to trap a known mass of liquid precursor. To calibrate the flow of the liquid precursor, the purge gas is used to push the trapped liquid precursor through the liquid flow meter at a steady rate. The elapsed time for evacuating the trapped liquid precursor from the purge line is measured. Calibration information is computed using the mass of the trapped liquid precursor and the measured elapsed time based on the direct liquid measurement approach.Type: GrantFiled: March 17, 1997Date of Patent: February 2, 1999Assignee: Applied Materials, Inc.Inventors: Yen-Kun Wang, Fong Chang, Thanh Pham, Jeff Plante
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Method and an apparatus for shaping the output traffic in a fixed length cell switching network node
Patent number: 5818815Abstract: A method and an apparatus for shaping the output traffic in the transmit part of a network node adapter. The network node supports fixed length cell switching user information traffic between a source unit and a destination unit. The method and apparatus use two lookup tables called an active and a standby calendar per output line. Each entry in the calendars represents the position of one cell in the output cell stream. Three parameters tables are used to store the information on user traffic in the descending order of the user bandwidth share negotiated at traffic establishment time for the calendars. The active calendar is continuously read by a transmit device and the corresponding cells are sent onto the output line. Under control of a control device, a placement device places entries in the standby calendar reserved as changes occur in the traffic. Once filled up, the standby calendar is swapped to the active calendar and is read by the transmit device.Type: GrantFiled: September 19, 1995Date of Patent: October 6, 1998Assignee: International Business Machines CorporationInventors: Regis Carpentier, Rene Glaise, Francois Kermarec, Thanh Pham -
Patent number: 5766483Abstract: A method for separating hydrogen fluoride from a chemical mixture is provided. In the process of the invention, hydrogen fluoride is separated from a chemical mixture containing hydrogen fluoride by contacting the chemical mixture with a hydrogen fluoride binder. The separated hydrogen fluoride may be recovered from the hydrogen fluoride binder.Type: GrantFiled: May 10, 1996Date of Patent: June 16, 1998Assignee: AlliedSignal Inc.Inventors: Mathew Hermes Luly, Jeffrey Warren Mckown, Robert Pratt, Rajiv Ratna Singh, Paul Frederick Kunkel, Charles Lewis Redmon, Hang Thanh Pham
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Patent number: 5763706Abstract: An integrated manufacturing process for producing HFC-245fa, HFC-236fa or a mixture thereof by reaction of HCC-240fa, HCC-230 or a mixture thereof with HF. HCC-240fa, HCC-230 or a mixture thereof is reacted with hydrogen fluoride in a liquid phase in the presence of a fluorination catalyst. Optionally, produced HCl is removed by distillation. HF present is thereafter recovered by liquid-vapor extraction. Unsaturated compounds are then removed by photochlorination and HFC-245fa, HFC-236fa or a mixture thereof is obtained by distillation.Type: GrantFiled: July 3, 1996Date of Patent: June 9, 1998Assignee: AlliedSignal Inc.Inventors: Hsueh Sung Tung, Daniel Chistopher Merkel, Zenart Joseph Dziadyk, Clayton Herbert Carson, Hang Thanh Pham
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Patent number: D425607Type: GrantFiled: August 11, 1998Date of Patent: May 23, 2000Inventor: Chau Thanh Pham