Patents by Inventor Thanh Trung Nguyen

Thanh Trung Nguyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240004625
    Abstract: Various embodiments of the present technology include an improved system for measuring the impacts of feature rollouts on machine utilization and service performance. More specifically, embodiments of the present technology include an exposure control system based on randomized machine assignments and a corresponding score card for comparing machine utilization metrics. In an embodiment, a computing apparatus identifies a new feature in a codebase, wherein the codebase has been updated with the new feature across multiple resources, enables the new feature for a target group of the multiple resources while keeping the new feature dormant for a control group of the multiple resources, collects performance information for the target group and the control group for a time period, and generates a visualization of one or more differences between the performance information for the target group and the performance information for the control group for the time period.
    Type: Application
    Filed: June 29, 2022
    Publication date: January 4, 2024
    Inventors: Prerana Dharmesh GAMBHIR, Sharena Meena PARI-MONASCH, Yongchang DONG, Thanh Trung NGUYEN, Shmuel NAVON, Qiong ZHOU, Yiming SHI, Linh Phuong NGUYEN, Xiao LIANG, Christopher Robert HAYWORTH, Daniel Ming-Wei CHEUNG
  • Patent number: 10240250
    Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.
    Type: Grant
    Filed: October 2, 2012
    Date of Patent: March 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Margaretha De Ruiter
  • Publication number: 20170333737
    Abstract: The invention provides a wearable air purification device which actively generates a propelled stream of purified air for direct delivery to a region proximal to a user's mouth or nose for their immediate inhalation. An air chamber comprises a flexible diaphragm adapted to fluctuate between two extreme positions, thereby altering the volume within the chamber and alternately sucking and blowing air into and out of the chamber. Filtration elements are arranged in said air chamber. The filtration elements are arranged so as to make fluid communication with air displaced into the air chamber and, to make fluid communication with air displaced out of said chamber so that air is cleaned as it passes both into, and out of, the air chamber. The filtration elements actively remove particulate or gaseous pollutants. Embodiments of the invention may comprise a plurality of such air chamber assemblies, arranged so as to collectively deliver a continuous flow of air to a breathing zone of the user.
    Type: Application
    Filed: December 15, 2015
    Publication date: November 23, 2017
    Inventors: RUI KE, CHRISTIAAN ZIMMER, HENDRIK RICHARD JOUSMA, THANH TRUNG NGUYEN, GERBEN KOOIJMAN
  • Patent number: 9285676
    Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
    Type: Grant
    Filed: June 7, 2012
    Date of Patent: March 15, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Henri Marie Joseph Boots, Thanh Trung Nguyen
  • Patent number: 9235125
    Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.
    Type: Grant
    Filed: February 6, 2013
    Date of Patent: January 12, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Thanh Trung Nguyen, Oktay Yildirim
  • Publication number: 20150010869
    Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer including first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition including a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.
    Type: Application
    Filed: February 6, 2013
    Publication date: January 8, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Emiel Peeters, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Thanh Trung Nguyen, Oktay Yildirim
  • Publication number: 20140299575
    Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
    Type: Application
    Filed: June 7, 2012
    Publication date: October 9, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Aurelie Marie Andree Brizard, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Henri Marie Joseph Boots, Thanh Trung Nguyen
  • Publication number: 20140245948
    Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.
    Type: Application
    Filed: October 2, 2012
    Publication date: September 4, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van Der Heijden, Hieronymus Johannus Christiaan Meessen, Roelof Koole, Emiel Peeters, Christianus Martinus Van Heesch, Aurelie Marie Andree Brizard, Henri Marie Joseph Boots, Tamara Druzhinina, Jessica Marggaretha De Ruiter
  • Publication number: 20110061775
    Abstract: The process for preparing metal-based materials for magnetic cooling or heat pumps comprises the following steps: a) reacting chemical elements and/or alloys in a stoichiometry which corresponds to the metal-based material in the solid phase and/or liquid phase, b) if appropriate converting the reaction product from stage a) to a solid, c) sintering and/or heat treating the solid from stage a) or b), d) quenching the sintered and/or heat treated solid from stage c) at a cooling rate of at least 100 K/s.
    Type: Application
    Filed: April 27, 2009
    Publication date: March 17, 2011
    Applicants: Technology Foundation STW, University of Amsterdam
    Inventors: Ekkehard Brueck, Thanh Trung Nguyen
  • Patent number: D693300
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: November 12, 2013
    Assignee: Nidec Servo Corporation
    Inventors: Shin Fukasawa, Thanh Trung Nguyen, Miho Arakawa