Patents by Inventor Thantip KRASIENAPIBAL

Thantip KRASIENAPIBAL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11380518
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: July 5, 2022
    Assignee: Hitachi, Ltd.
    Inventors: Takafumi Miwa, Hirokazu Tamaki, Momoyo Enyama, Makoto Sakakibara, Sayaka Kurata, Atsuko Shintani, Takashi Dobashi, Kotoko Urano, Akiko Kagatsume, Minseok Park, Yasuhiro Shirasaki, Thantip Krasienapibal
  • Patent number: 11334761
    Abstract: An information processing system creates a teacher database configured to train an analysis model from an observation image and labeling information corresponding to the observation image using an information processor. This system includes a storage unit, an image processing unit, and a teacher database creating unit. The storage unit stores image processing data formed of information showing a relationship between an observation condition and a parameter relating to the observation image. Further stores a first observation image, a first observation condition, and first labeling information. The image processing unit accepts the first observation image and the first observation condition as inputs, performs image processing corresponding to the parameter to the first observation image based on the image processing data, and creates a second observation image corresponding to a second observation condition.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: May 17, 2022
    Assignee: HITACHI, LTD.
    Inventors: Thantip Krasienapibal, Sayaka Kurata, Momoyo Enyama, Yasuhiro Shirasaki
  • Publication number: 20210407763
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Application
    Filed: August 9, 2019
    Publication date: December 30, 2021
    Inventors: Takafumi MIWA, Hirokazu TAMAKI, Momoyo ENYAMA, Makoto SAKAKIBARA, Sayaka KURATA, Atsuko SHINTANI, Takashi DOBASHI, Kotoko URANO, Akiko KAGATSUME, Minseok PARK, Yasuhiro SHIRASAKI, Thantip KRASIENAPIBAL
  • Publication number: 20200257937
    Abstract: An information processing system creates a teacher database configured to train an analysis model from an observation image and labeling information corresponding to the observation image using an information processor. This system includes a storage unit, an image processing unit, and a teacher database creating unit. The storage unit stores image processing data formed of information showing a relationship between an observation condition and a parameter relating to the observation image. Further stores a first observation image, a first observation condition, and first labeling information. The image processing unit accepts the first observation image and the first observation condition as inputs, performs image processing corresponding to the parameter to the first observation image based on the image processing data, and creates a second observation image corresponding to a second observation condition.
    Type: Application
    Filed: December 12, 2019
    Publication date: August 13, 2020
    Applicant: HITACHI, LTD.
    Inventors: Thantip KRASIENAPIBAL, Sayaka KURATA, Momoyo ENYAMA, Yasuhiro SHIRASAKI
  • Patent number: 10483083
    Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: November 19, 2019
    Assignee: HITACHI, LTD.
    Inventors: Thantip Krasienapibal, Yasuhiro Shirasaki, Momoyo Enyama, Sayaka Kurata
  • Publication number: 20190035597
    Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.
    Type: Application
    Filed: July 24, 2018
    Publication date: January 31, 2019
    Inventors: Thantip KRASIENAPIBAL, Yasuhiro SHIRASAKI, Momoyo ENYAMA, Sayaka KURATA