Patents by Inventor Thao Duc Pham

Thao Duc Pham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing high aspect ratio photolithographic features
    Patent number: 6664026
    Abstract: An etch barrier to be used in a photolithograph process is disclosed. A silicon rich etch barrier is deposited on a substrate using a low energy deposition technique. A diamond like carbon layer is deposited on the silicon rich etch barrier. Photoresist is then placed on this etch barrier DLC combination. To form photolithographic features, successive steps of oxygen and flourine reactive ion etching is used.
    Type: Grant
    Filed: March 22, 2001
    Date of Patent: December 16, 2003
    Assignee: International Business Machines Corporation
    Inventors: Son Van Nguyen, Neil Leslie Robertson, Thomas Edward Dinan, Thao Duc Pham
  • Method of manufacturing high aspect ratio photolithographic features
    Publication number: 20020136990
    Abstract: An etch barrier to be used in a photolithograph process is disclosed. A silicon rich etch barrier is deposited on a substrate using a low energy deposition technique. A diamond like carbon layer is deposited on the silicon rich etch barrier. Photoresist is then placed on this etch barrier DLC combination. To form photolithographic features, successive steps of oxygen and flourine reactive ion etching is used.
    Type: Application
    Filed: March 22, 2001
    Publication date: September 26, 2002
    Inventors: Son Van Nguyen, Neil Leslie Robertson, Thomas Edward Dinan, Thao Duc Pham