Publication number: 20220298637
Abstract: The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R? is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.
Type:
Application
Filed:
May 27, 2020
Publication date:
September 22, 2022
Inventors:
Sinja Verena KLENK, David Dominique SCHWEINFURTH, Lukas MAYR, Sabine WEIGUNY, Charles Winter, Nilanka WEERATHUNGA SIRIKKATHUGE, Tharindu KARUNARATNE