Abstract: An apparatus in some implementations includes a metalens, an image sensor, and an actuator. The metalens is con-figured to generate multiple diffractive orders of an image at respective corresponding focal lengths. The actuator is operable to move at least one of the metalens or the image sensor to each of multiple positions so that a distance between the metalens and the image sensor is adjustable. The distance between the metalens and the image sensor for each respective one of the positions corresponds to a particular one of the focal lengths.

Abstract: The manufacture of surface emitting lasers that include an optical metastructure are described. For example, in accordance with some implementations, a method includes providing a sequence of semiconductor layers and processing the sequence of semiconductor layers to form an upper reflector disposed over an active layer, the active layer being disposed over a lower reflector, and the lower reflector layer being disposed over a substrate. The semiconductor layers in which the upper reflector is formed include one or more outer semiconductor layers, and the method includes forming a metastructure in the one or more outer semiconductor layers.

Abstract: The invention concerns a super hydrophobic surface for handling a liquid and/or able to be contacted by a liquid, said surface comprising at least one hydrophobic liquid contact surface portion, wherein said hydrophobic liquid contact surface portion presents a micro- and nano-meter hierarchical patterned structure, the structure comprising: —homogeneously distributed micrometre-sized pillars (1), and—homogeneously distributed nanometre-sized pillars (2), preferably said pillars (2) having a dimension below 1 micrometer, at the upper surface of the micrometre-sized pillars, and—nanometre-sized protrusions (3) at the upper surface of the nanometre-sized pillars, the protrusions being positioned in a non-periodic, irregular pattern. The invention also relates to the use of such surfaces with micro- and nano-meter hierarchical patterned structure, for example in handling hot liquids, and a corresponding manufacturing process, e.g. using an injection moulding process for producing the component in polymer.

Abstract: The present invention relates to a nano-imprinting stamp for imprinting nanometer-sized to mm-sized structures, the stamp (1) having a base part and a first and a second imprinting section (2,3), the first and second imprinting sections having a lithographic pattern (7) intended for imprinting in a receiving substrate. In a first aspect, the first and the second imprinting sections (2,3) are independently displaceable in a direction substantially parallel to an imprinting direction of the imprinting stamp. In a second aspect, the first and the second imprinting sections (2,3) are mechanically weakly coupled in a direction substantially parallel to an imprinting direction of the imprinting stamp. The stamp limits the effect of imperfections in or on the substrate to be imprinted with a lithographic pattern (7) and imperfections in or on the stamp and any combinations of such imperfections by localising the bending of the stamp to the base part (5) in-between the imprinting sections (2,3).

Abstract: The present invention relates to a nano-imprinting stamp for imprinting nanometer-sized to mm-sized structures, the stamp (1) having a base part and a first and a second imprinting section (2,3), the first and second imprinting sections having a lithographic pattern (7) intended for imprinting in a receiving substrate. In a first aspect, the first and the second imprinting sections (2,3) are independently displaceable in a direction substantially parallel to an imprinting direction of the imprinting stamp. In a second aspect, the first and the second imprinting sections (2,3) are mechanically weakly coupled in a direction substantially parallel to an imprinting direction of the imprinting stamp. The stamp limits the effect of imperfections in or on the substrate to be imprinted with a lithographic pattern (7) and imperfections in or on the stamp and any combinations of such imperfections by localising the bending of the stamp to the base part (5) in-between the imprinting sections (2,3).