Patents by Inventor Theodor O. Mohr

Theodor O. Mohr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for producing undercut dummy gate mask profiles for MESFETs
    Patent number: 4732871
    Abstract: Process for producing temperature-stable undercut profiles for use in semiconductor fabrication. The process is based on the phenomenon of high etch-rate selectivity between RF- and LF- PECVD-grown silicon nitride films (12G and 13G, respectively) that are deposited on top of each other. By choosing proper film and process parameters, these PECVD nitride structures can be made stress-free: the tensile stress of the RF film (12G) compensates the compressive stress of the LF film (13G).Also disclosed is an application of a T-shaped structure (15), produced with the new process, in a method for fabricating fully self-aligned "dummy" gate sub-micron MESFETs.
    Type: Grant
    Filed: March 30, 1987
    Date of Patent: March 22, 1988
    Assignee: International Business Machines Corporation
    Inventors: Peter L. Buchmann, Volker Graf, Peter D. Hoh, Theodor O. Mohr, Peter Vettiger