Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: The current limits of resolution of multi-element optical systems are exceeded by reducing the number of elements while introducing at the critical aperture a blazed transmission grating having grating rings of low bending power defined by multiple plateaus. By illuminating the optical train with monochromatic light that constitutes a multiplicity of distributed sources having a substantial temporal coherence but spatial incoherence and by varying the slopes and widths of the grating rings, local phase delays are introduced that adjust aberrations in the optical system, providing an aligned composite wavefront. The system and method may be used for presenting an image, as for a wafer stepper, or for viewing an image, as in a microscope.

Abstract: The current limits of resolution of multi-element optical systems are exceeded by reducing the number of elements while introducing at the critical aperture a blazed transmission grating having grating rings of low bending power defined by multiple plateaus. By illuminating the optical train with monochromatic light that constitutes a multiplicity of distributed sources having a substantial temporal coherence but spatial incoherence and by varying the slopes and widths of the grating rings, local phase delays are introduced that adjust aberrations in the optical system, providing an aligned composite wavefront. The system and method may be used for presenting an image, as for a wafer stepper, or for viewing an image, as in a microscope.

Abstract: The current limits of resolution of multi-element optical systems are exceeded by reducing the number of elements while introducing at the critical aperture a blazed transmission grating having grating rings of low bending power defined by multiple plateaus. By illuminating the optical train with monochromatic light that constitutes a multiplicity of distributed sources having a substantial temporal coherence but spatial incoherence and by varying the slopes and widths of the grating rings, local phase delays are introduced that adjust aberrations in the optical system, providing an aligned composite wavefront. The system and method may be used for presenting an image, as for a wafer stepper, or for viewing an image, as in a microscope.

Abstract: The current limits of resolution of multi-element optical systems are exceeded by reducing the number of elements while introducing at the critical aperture a blazed transmission grating having grating rings of low bending power defined by multiple plateaus. By illuminating the optical train with monochromatic light that constitutes a multiplicity of distributed sources having a substantial temporal coherence but spatial incoherence and by varying the slopes and widths of the grating rings, local phase delays are introduced that adjust aberrations in the optical system, providing an aligned composite wavefront. The system and method may be used for presenting an image, as for a wafer stepper, or for viewing an image, as in a microscope.

Abstract: Apparatus (10) for controlling a beam (12) of coherent light includes a reference scale (38, 138) provided with indicia forming a plurality of spokes having two sets of properties. The first of the two sets of properties is an evenly spaced first set of edges (41) arranged for generating a data clock exactly referenced to a position of a first of the two separate, perpendicular directions. A second set of edges (44) are each spaced variably from an associated one of the first set of edges (41) as a function of the other of the two separate, perpendicular directions, making the second of the two sets of properties a variable width of each of the spokes.

Abstract: In this laser pattern generator, plural laser beams are arranged in a closely spaced, noninterfering array. The beams are concurrently deflected across a region of the target surface by an acousto-optic deflector driven by a swept frequency drive signal. The target is moved perpendicular to the direction of deflection to reposition it for exposure during the next stroke of the beams. The extent of target offset in the direction of deflection is measured and used to control initiation of modulation during each deflection stroke, so that each portion of the generated pattern begins from a uniform reference line on the target. Pattern data is supplied to the beam modulators in accordance with data clock pulses the repetition rate of which is established by the rate of change of frequency of the deflector drive signal.

Abstract: In this laser pattern generator, plural laser beams are arranged in a closely spaced, noninterfering array. The beams are concurrently deflected across a region of the target surface by an acousto-optic deflector driven by a swept frequency drive signal. The target is moved perpendicular to the direction of deflection to reposition it for exposure during the next stroke of the beams. The extent of target offset in the direction of deflection is measured and used to control initiation of modulation during each deflection stroke, so that each portion of the generated pattern begins from a uniform reference line on the target. Pattern data is supplied to the beam modulators in accordance with data clock pulses the repetition rate of which is established by the rate of change of frequency of the deflector drive signal.