Patents by Inventor Theodorus Leonardus Van Den Akker

Theodorus Leonardus Van Den Akker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
    Patent number: 7812930
    Abstract: A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method includes generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: October 12, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Theodorus Leonardus Van Den Akker, Martinus Hendricus Hendricus Hoeks, Pieter Willem Herman De Jager, Lambertus Gerardus Maria Kessels, Marco Cornelis Jacobus Martinus Van Hassel, Frank Anton Morselt
  • Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
    Patent number: 7209216
    Abstract: A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
    Type: Grant
    Filed: March 25, 2005
    Date of Patent: April 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Willem Herman De Jager, Theodorus Leonardus Van Den Akker, Willem Jurrianus Venema, Wouter Frans Willem Mulckhuyse, Lambertus Gerardus Maria Kessels
  • Lithographic apparatus and device manufacturing method
    Patent number: 7016016
    Abstract: A lithographic apparatus patterns a projection beam of radiation using a patterning system. A substrate is supported on a substrate table and the patterned beam is projected onto the substrate on the table. A substrate displacement control system displaces the substrate relative to the table and the projection system in a predetermined direction, such that the patterned beam is scanned across the substrate. The position of the substrate relative to the table and the patterned beam is determined by the displacement control system. The displacement control system comprises at least one component that is displaceable with the substrate and a positioning apparatus to place that component in contact with the substrate, such that the component is displaced with the substrate as the projection beam is scanned across the substrate and such that the component is lifted from the substrate after the projection beams has been scanned across the substrate.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: March 21, 2006
    Assignee: ASML Netherlands BV
    Inventors: Robert-Han Munnig Schmidt, Pieter Willem Herman De Jager, Theodorus Leonardus Van Den Akker