Patents by Inventor Theodorus Van Den Akker

Theodorus Van Den Akker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FLUID PURGING SYSTEM
    Publication number: 20230314964
    Abstract: The present invention provides a fluid purging system (100) for an optical element (120), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface (122) of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit (110) for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion (102) and at least a second wall portion (104), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit (112).
    Type: Application
    Filed: May 10, 2021
    Publication date: October 5, 2023
    Applicant: ASML Netherlands B.V.
    Inventors: José Nilton FONSECA JUNIOR, Zhuangxiong HUANG, Franciscus Johannes Leonardus HEUTZ, Ferdy MIGCHELBRINK, Henricus Anita Jozef Wilhelmus VAN DE VEN, Ramo OMEROVIC, Emericus Antoon Theodorus VAN DEN AKKER
  • Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography
    Publication number: 20060215142
    Abstract: A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
    Type: Application
    Filed: March 25, 2005
    Publication date: September 28, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Willem De Jager, Theodorus Van Den Akker, Willem Venema, Wouter Mulckhuyse, Lambertus Gerardus Kessels
  • Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
    Publication number: 20060209313
    Abstract: A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
    Type: Application
    Filed: March 21, 2005
    Publication date: September 21, 2006
    Applicant: ASML NetherlandS B.V.
    Inventors: Theodorus Van Den Akker, Martinus Hendricus Hoeks, Pieter De Jager, Lambertus Kessels, Marco Martinus Van Hassel, Frank Morselt