Abstract: A method and performance-screen ring oscillator (PSRO) test structure for designing, testing, and manufacturing a VLSI device. The performance-screen ring oscillator (PSRO) test structure comprises a ring oscillator having a plurality of stages; one or more selectable loads, each selectable load being coupled to an output of a corresponding one of the stages of the ring oscillator; and one or more multiplexers, each multiplexer being coupled to at least one stage of the ring oscillator and being configured to select a configuration of the corresponding selectable load.

Abstract: A method and performance-screen ring oscillator (PSRO) test structure for designing, testing, and manufacturing a VLSI device. The performance-screen ring oscillator (PSRO) test structure comprises a ring oscillator having a plurality of stages; one or more selectable loads, each selectable load being coupled to an output of a corresponding one of the stages of the ring oscillator; and one or more multiplexers, each multiplexer being coupled to at least one stage of the ring oscillator and being configured to select a configuration of the corresponding selectable load.

Abstract: After printing common features from a primary mask into a photoresist layer located over a substrate, a functional feature which is suitable for changing functionalities or the configurations of the common features according to a chip design is selected from a library of additional functional features in a secondary mask. The selected functional feature from the secondary mask is printed into the photoresist layer to modify the common features that already exist in the photoresist layer. The selection and printing of functional feature processes can be repeated until a final image corresponding to the chip design is obtained in the photoresist layer.

Abstract: Embodiments are directed to a semiconductor wafer having on-wafer circuitry. The on-wafer circuitry includes functional circuitry and first drive circuitry communicatively coupled to the functional circuitry. The on-wafer circuitry further includes test-only circuitry communicatively coupled to the functional circuitry, along with second drive circuitry communicatively coupled to the test-only circuitry. The control circuitry is communicatively coupled to the second drive circuitry and the test-only circuitry, wherein the first drive circuitry is configured to drive the functional circuitry in a first manner, and wherein the control circuitry is configured to control the second drive circuitry to drive the test-only circuitry in a second manner that is independent of the first manner.

Abstract: After printing common features from a primary mask into a photoresist layer located over a substrate, a functional feature which is suitable for changing functionalities or the configurations of the common features according to a chip design is selected from a library of additional functional features in a secondary mask. The selected functional feature from the secondary mask is printed into the photoresist layer to modify the common features that already exist in the photoresist layer. The selection and printing of functional feature processes can be repeated until a final image corresponding to the chip design is obtained in the photoresist layer.

Abstract: Embodiments are directed to a semiconductor wafer having on-wafer circuitry. The on-wafer circuitry includes functional circuitry and first drive circuitry communicatively coupled to the functional circuitry. The on-wafer circuitry further includes test-only circuitry communicatively coupled to the functional circuitry, along with second drive circuitry communicatively coupled to the test-only circuitry. The control circuitry is communicatively coupled to the second drive circuitry and the test-only circuitry, wherein the first drive circuitry is configured to drive the functional circuitry in a first manner, and wherein the control circuitry is configured to control the second drive circuitry to drive the test-only circuitry in a second manner that is independent of the first manner.