Patents by Inventor Theresa K. Guarini

Theresa K. Guarini has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for precleaning a substrate surface prior to epitaxial growth
    Patent number: 10837122
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: November 17, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher S. Olsen, Theresa K. Guarini, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi Wei Lo, Saurabh Chopra
  • METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH
    Publication number: 20190382917
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Application
    Filed: August 26, 2019
    Publication date: December 19, 2019
    Inventors: Christopher S. OLSEN, Theresa K. GUARINI, Jeffrey TOBIN, Lara HAWRYLCHAK, Peter STONE, Chi Wei LO, Saurabh CHOPRA
  • Method and apparatus for precleaning a substrate surface prior to epitaxial growth
    Patent number: 10428441
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: October 1, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher S. Olsen, Theresa K. Guarini, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi Wei Lo, Saurabh Chopra
  • METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH
    Publication number: 20180016705
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Application
    Filed: June 19, 2017
    Publication date: January 18, 2018
    Inventors: Christopher S. OLSEN, Theresa K. GUARINI, Jeffrey TOBIN, Lara HAWRYLCHAK, Peter STONE, Chi Wei LO, Saurabh CHOPRA
  • Method and apparatus for precleaning a substrate surface prior to epitaxial growth
    Patent number: 9683308
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Grant
    Filed: July 22, 2014
    Date of Patent: June 20, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Christopher S. Olsen, Theresa K. Guarini, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi Wei Lo, Saurabh Chopra
  • METHOD AND APPARATUS FOR PRECLEANING A SUBSTRATE SURFACE PRIOR TO EPITAXIAL GROWTH
    Publication number: 20150040822
    Abstract: Embodiments of the present invention generally relate to methods for removing contaminants and native oxides from substrate surfaces. The methods generally include removing contaminants disposed on the substrate surface using a plasma process, and then cleaning the substrate surface by use of a remote plasma assisted dry etch process.
    Type: Application
    Filed: July 22, 2014
    Publication date: February 12, 2015
    Inventors: Christopher S. OLSEN, Theresa K. Guarini, Jeffrey Tobin, Lara Hawrylchak, Peter Stone, Chi Wei Lo, Saurabh Chopra