Patents by Inventor Theresa Mary SPAAN-BURKE

Theresa Mary SPAAN-BURKE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Stage system, lithographic apparatus, method for positioning and device manufacturing method
    Patent number: 11860552
    Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
    Type: Grant
    Filed: June 12, 2017
    Date of Patent: January 2, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Stef Marten Johan Janssens, Bert Dirk Scholten, Sjoerd Nicolaas Lambertus Donders, Teunis Van Dam, Peter Mark Overschie, Theresa Mary Spaan-Burke, Siegfried Alexander Tromp
  • STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD
    Publication number: 20190187571
    Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
    Type: Application
    Filed: June 12, 2017
    Publication date: June 20, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stef Marten Johan JANSSENS, Bert Dirk SCHOLTEN, Sjoerd Nicolaas Lambertus DONDERS, Teunis VAN DAM, Peter Mark OVERSCHIE, Theresa Mary SPAAN-BURKE, Siegfried Alexander TROMP