Patents by Inventor Thibault Simon Mathieu Laurent

Thibault Simon Mathieu Laurent has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20120307216
    Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
    Type: Application
    Filed: June 4, 2012
    Publication date: December 6, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria KUSTERS, Johan Gertrudis Cornelis KUNNEN, Sander Catharina Reinier DERKS
  • Publication number: 20120013865
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendricus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • Publication number: 20110222032
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas TEN KATE, Johannes Henricus Wilhelmus JACOBS, Joost Jeroen OTTENS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Thibault Simon Mathieu LAURENT, Robbert Jan VOOGD, Giovanni Francisco NINO, Johan Gertrudis Cornelis KUNNEN, Marinus Jan REMIE
  • Publication number: 20110222033
    Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
    Type: Application
    Filed: March 11, 2011
    Publication date: September 15, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Johannes Henricus Wilhelmus Jacobs, Joost Jeroen Ottens, Bastiaan Andreas Wilhelmus Hubertus Knarren, Thibault Simon Mathieu Laurent, Robbert Jan Voogd, Giovanni Francisco Nino, Johan Gertrudis Cornelis Kunnen, Marinus Jan Remie
  • Publication number: 20110181849
    Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.
    Type: Application
    Filed: January 20, 2011
    Publication date: July 28, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hrishikesh PATEL, Johannes Henricus Wilhelmus Jacobs, Gerardus Adrianus Antonius Maria Kusters, Thibault Simon Mathieu Laurent, Marcio Alexandre Cano Miranda, Ruud Hendricus Martinus Johannes Bloks, Peng Feng, Johan Gertrudis Cornelis Kunnen