Abstract: The invention relates to a method of manufacturing, on a silicon wafer, a plurality of integrated circuits and at least one test circuit, comprising steps of insulation of the silicon wafer by means of a reticle disposed in an exposure chamber provided with a diaphragm which allows to hide the non useful parts of the reticle. According to the invention, the method comprises an insulation (exposure) step performed by means of a reticle (130) comprising an insulation mask region (132) for integrated circuits together with at least one insulation mask region (133, 134, 135) for a test circuit. The insulation step includes one or more insulation steps during which the insulation mask region for test circuit is hidden by the diaphragm, and at least one insulation step during which the insulation mask region for test circuit is uncovered by the diaphragm, while all or part of the insulation mask for integrated circuit is hidden by the diaphragm.