Abstract: A computer implemented method for configuring a coating process to deposit a targeted mono- or multi-layered coating on a substrate, the method providing as output a series of ordered tasks executed on the coating process, and includes (a) providing a dataset including a data related to parameters of the coating process; (b) providing a set of algorithms which takes, as input, data from the dataset of (a) and provides, as output, series of at least one tasks associated to each algorithm; selecting two algorithms from the set of algorithms depending on current states of the coating process as provided as input data, and (d) selecting an order in which the algorithms selected at (c) has to be carried out so that the tasks provided by the algorithms are organized as a series of ordered tasks which are executed contextually onto the coating process at corresponding stages in the coating process.

Abstract: A method for adjusting at least two parameters of a coating process to manufacture a coated transparent substrate including a multi-layered coating according to a targeted value for at least one quality function for the coated transparent substrate. The method relies on a set of different mathematical prediction models in the training procedure, which, once trained, when they are used either sequentially, alternatively or in parallel, during the prediction procedure, allow to counteract or counterbalance drifts that may potentially occur from one of them. Outstanding benefits are that misbehaviours of current feedback methods may be prevented, that changes in the local atmosphere of deposit cells, and in turn in the chemistry of coated layers, which may occur from temperature and/or humidity variation, may be compensated, and that more than one coating process parameters may be adjusted at the same time.

Abstract: A computer implemented methods for estimating at least one quality function of a given layered coating on a transparent substrate allows to predict at least one non in-process measured quality function of a given layered coating on a transparent substrate from an in-process measured quality function which can be acquired on the coated substrate as deposited at any location, preferably at the end of a coating process. The method allows to get rid of in-process real-time continuous measurements of quality functions of the coated transparent substrate and real-time monitoring of coating process parameters.

Abstract: A method for adjusting at least two parameters of a coating process to manufacture a coated transparent substrate including a multi-layered coating according to a targeted value for at least one quality function for the coated transparent substrate. The method relies on a set of different mathematical prediction models in the training procedure, which, once trained, when they are used either sequentially, alternatively or in parallel, during the prediction procedure, allow to counteract or counterbalance drifts that may potentially occur from one of them. Outstanding benefits are that misbehaviours of current feedback methods may be prevented, that changes in the local atmosphere of deposit cells, and in turn in the chemistry of coated layers, which may occur from temperature and/or humidity variation, may be compensated, and that more than one coating process parameters may be adjusted at the same time.

Abstract: A computer implemented method for configuring a coating process to deposit a targeted mono- or multi-layered coating on a substrate, the method providing as output a series of ordered tasks executed on the coating process, and includes (a) providing a dataset including a data related to parameters of the coating process; (b) providing a set of algorithms which takes, as input, data from the dataset of (a) and provides, as output, series of at least one tasks associated to each algorithm; selecting two algorithms from the set of algorithms depending on current states of the coating process as provided as input data, and (d) selecting an order in which the algorithms selected at (c) has to be carried out so that the tasks provided by the algorithms are organized as a series of ordered tasks which are executed contextually onto the coating process at corresponding stages in the coating process.

Abstract: An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.

Abstract: A computer implemented methods for estimating at least one quality function of a given layered coating on a transparent substrate allows to predict at least one non in-process measured quality function of a given layered coating on a transparent substrate from an in-process measured quality function which can be acquired on the coated substrate as deposited at any location, preferably at the end of a coating process. The method allows to get rid of in-process real-time continuous measurements of quality functions of the coated transparent substrate and real-time monitoring of coating process parameters.

Abstract: A method for locating, in a deposition line including a succession of compartments, an origin of a defect affecting a stack of thin layers deposited on a substrate in the compartments, in which each thin layer is deposited in one or more successive compartments of the deposition line and pieces of debris remaining on the surface of a thin layer deposited in a compartment act as masks for the subsequent depositions of thin layers and are the origin of defects, includes obtaining at least one image showing the defect, determining, from the at least one image, a signature of the defect, the signature containing at least one characteristic representative of the defect, and identifying at least one compartment of the deposition line liable to be the origin of the defect from the signature of the defect and using reference signatures associated with the compartments of the deposition line.

Abstract: An adjustment-determining method includes obtaining a mathematical model relating an operating parameter of the deposition line to a quality function defined from a quality measurement of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining a value of the quality function from a value of the quality measurement measured at the outlet of the deposition line on a stack of thin layers deposited by the deposition line on a substrate while the deposition line was set so that an operating parameter had a current value; and automatically determining by the mathematical model an adjustment value for the current value of the operating parameter serving to reduce a difference that exists between the value obtained for the quality function and a target value selected for the quality function for the stack of thin layers.

Abstract: A material includes a transparent substrate coated with a stack of thin layers successively including, starting from the substrate, an alternation of three silver-based functional metallic layers and of four dielectric coatings, so that each functional metallic layer is positioned between two dielectric coatings. The thicknesses of the three functional layers and the thicknesses of the dielectric coatings are selected in order to give the materials solar factor values of less than 20% for a light transmission of the order of 40%.

Abstract: A method for locating, in a deposition line including a succession of compartments, an origin of a defect affecting a stack of thin layers deposited on a substrate in the compartments, in which each thin layer is deposited in one or more successive compartments of the deposition line and pieces of debris remaining on the surface of a thin layer deposited in a compartment act as masks for the subsequent depositions of thin layers and are the origin of defects, includes obtaining at least one image showing the defect, determining, from the at least one image, a signature of the defect, the signature containing at least one characteristic representative of the defect, and identifying at least one compartment of the deposition line liable to be the origin of the defect from the signature of the defect and using reference signatures associated with the compartments of the deposition line.

Abstract: A material includes a transparent substrate coated with a stack of thin layers successively including, starting from the substrate, an alternation of three silver-based functional metallic layers and of four dielectric coatings, so that each functional metallic layer is positioned between two dielectric coatings. The thicknesses of the three functional layers and the thicknesses of the dielectric coatings are selected in order to give the materials solar factor values of less than 20% for a light transmission of the order of 40%.