Abstract: An apparatus and method for the treatment of gaseous effluents involving contact with a liquid may include a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, wherein the chamber allows a gas to be treated. The chamber may also release residual gases following treatment involving contact with the liquid. The apparatus may also include a turbine that includes one or more stages which ensure improved contact between the gas and the liquid, the upper part of the turbine being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, a sensor for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: The invention relates to an apparatus for the treatment of gaseous effluents, such as those originating from the production of semi-conductors involving contact with a liquid. The inventive apparatus consists of: a gas/liquid contact chamber which can receive a liquid in the lower part thereof and which is topped with a gas cover, said chamber comprising means for introducing a gas to be treated and means for releasing residual gases following treatment involving contact with the liquid; turbine-type gas/liquid contacting means comprising one or more stages which ensure improved contact between the gas and the liquid, the upper part of said means being equipped with an opening for drawing the gas situated in the gas cover above the liquid; and, preferably, means for measuring the pH of the liquid.

Abstract: A process for producing a high-purity liquid chemical is provided. A chemical gas is successively purified over first and second purification columns by passing, countercurrently, a scrubbing solution of initially deionized high-purity water through the first and second purification columns, or by passing, countercurrently, a first scrubbing solution of initially deionized high-purity water through the first column and a second scrubbing solution of initially deionized water through the second column. Each of the scrubbing solutions gradually becomes a spent scrubbing solution loaded with impurity. A high-purity chemical gas leaves the second purification column with a low content of metallic elements. The high-purity chemical gas is subsequently dissolved in a liquid in a dissolution column including a top and a bottom. The liquid at the bottom of the dissolution column is collected and continuously recirculated, and is enriched with purified chemical gas, thereby forming a high-purity liquid chemical.

Abstract: System for diluting an ultrapure concentrated chemical including: (i) a first tank which contains the chemical in concentrated form having a predetermined purity P, (ii) a supply of ultrapure water of purity at least equal to P, (iii) a second tank for mixing the concentrated chemical with the ultrapure water to obtain a solution of diluted chemical whose purity is at least equal to P, (iv) a structure for adjusting the titre of the solution of diluted, chemical to a desired final concentration.

Abstract: An apparatus for delivering abrasive suspensions includes a reservoir containing an abrasive suspension, a loop for delivering the abrasive suspension to a point of use, the loop being connected to the reservoir, a pumping arrangement for circulating the abrasive suspension in the loop and for ensuring its return into the reservoir, the loop and the reservoir being arranged for recovering the abrasive suspension after circulation in the loop at a recovery point of the reservoir, and a control system for controlling the pumping arrangement so as to maintain a continuous circulation of the suspension.