Patents by Inventor Thierry Lagarde

Thierry Lagarde has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7585421
    Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.
    Type: Grant
    Filed: January 7, 2003
    Date of Patent: September 8, 2009
    Assignee: Centre National de la Recherche Scientifique (CNRS)
    Inventors: Thierry Lagarde, Jacques Pelletier, Ana Lacoste, Yves Alban-Marie Arnal
  • Publication number: 20060263548
    Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.
    Type: Application
    Filed: January 7, 2003
    Publication date: November 23, 2006
    Inventors: Thierry Lagarde, Jacques Pelletier, Ana Lacoste, Yves Arnal
  • Publication number: 20060086322
    Abstract: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.
    Type: Application
    Filed: June 3, 2004
    Publication date: April 27, 2006
    Inventors: Thierry Lagarde, Ana Lacoste, Jacques Pelletier, Yves Arnal
  • Patent number: 6407359
    Abstract: The invention provides apparatus having a series of individual plasma excitation devices each constituted by a wire applicator of microwave energy, having one end connected to a source for producing microwave energy and having an opposite end fitted with at least one magnetic dipole for creating at least one surface having a magnetic field that is constant and of intensity corresponding to electron cyclotron resonance, the dipole being mounted at the end of the microwave applicator in such a manner as to ensure that electrons accelerated to electron cyclotron resonance oscillate between the poles so as to create a plasma diffusion zone situated on the side of the dipole that is remote from the end of the applicator, the individual excitation devices being distributed relative to one another and in proximity with the work surface so as to create together a plasma that is uniform for the work surface.
    Type: Grant
    Filed: August 2, 2000
    Date of Patent: June 18, 2002
    Assignee: Metal Process (Societe a Responsabilite Limitee)
    Inventors: Thierry Lagarde, Jacques Pelletier
  • Patent number: 6403490
    Abstract: A method of producing a plasma by capacitive discharges between an active electrode and a passive electrode within a sealed chamber at controlled pressure, the passive electrode being placed at a given electric potential while the active electrode is fed with a discharge-maintaining voltage. The active electrode and passive electrode define a separation plane therebetween parallel to the electrodes. According to the method, a multipole magnetic barrier is placed between the electrodes within the sealed chamber, the multipole magnetic barrier producing magnetic field lines extending across the separation plane. Fast electrons accelerated by the active electrode are caused to oscillate between magnetic poles in order to create plasma production and diffusion zones that are situated on either side of a magnetic barrier facing each of the electrodes.
    Type: Grant
    Filed: October 19, 2000
    Date of Patent: June 11, 2002
    Assignee: Metal Process (Societe a Responsabilite Limitee)
    Inventors: Thierry Lagarde, Jacques Pelletier