Patents by Inventor Thijs Egidius Johannes Knaapen

Thijs Egidius Johannes Knaapen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8780321
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 15, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Method of inspecting a substrate and method of preparing a substrate for lithography
    Patent number: 8435593
    Abstract: A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer.
    Type: Grant
    Filed: May 22, 2007
    Date of Patent: May 7, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Rik Teodoor Vangheluwe, Youri Johannes Laurentius Maria Van Dommelen, Johannes Anna Quaedackers, Cédric Désiré Grouwstra, Thijs Egidius Johannes Knaapen, Ralf Martinus Marinus Daverveld, Jeroen Hubert Rommers
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273679
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes Knaapen, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100157260
    Abstract: A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 24, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thijs Egidius Johannes KNAAPEN, Richard Joseph Bruls, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Martijn Hendrik Kamphuis, Paulus Martinus Maria Liebregts, Rudolf Adrianus Joannes Maas, Marco Koert Stavenga, Coen Cornelis Wilhelmus Verspaget, Rudy Jan Maria Pellens, Jan Cornelis Van Der Hoeven, David Lucien Anstotz, Gert-Jan Gerardus Johannes Thomas Brands, Marcus Johannes Van Der Zanden, Vijay Kumar Badam, Casper Roderik De Groot
  • Method of inspecting a substrate and method of preparing a substrate for lithography
    Publication number: 20080292780
    Abstract: A method of inspecting a substrate with first and second layers thereon is disclosed. The method includes directing a beam of electromagnetic radiation at an acute angle towards an edge of the layers, detecting scattered and/or reflected electromagnetic radiation, and establishing, from results of the detecting, whether an edge of the second layer overlaps an edge of the first layer.
    Type: Application
    Filed: May 22, 2007
    Publication date: November 27, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Rik Teodoor Vangheluwe, Youri Johannes Laurentius Maria Van Dommelen, Johannes Anna Quaedackers, Cedric Desire Grouwstra, Thijs Egidius Johannes Knaapen, Ralf Martinus Marinus Daverveld, Jeroen Hubert Rommers