Patents by Inventor Thijs Johan Henry HOLLINK

Thijs Johan Henry HOLLINK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Illumination system and lithographic apparatus
    Patent number: 8885144
    Abstract: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
    Type: Grant
    Filed: May 24, 2011
    Date of Patent: November 11, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Bert Jan Claessens, Heine Melle Mulder, Paul Van Der Veen, Wilfred Edward Endendijk, Willem Jan Bouman, Bert Pieter Van Drieënhuizen, Jozef Ferdinand Dymphna Verbeeck, Marc Hendricus Margaretha Dassen, Thijs Johan Henry Hollink
  • Lithographic Apparatus and Method
    Publication number: 20130044302
    Abstract: A lithographic apparatus includes an illumination system, a patterning device, and a projection system. The illumination system provides a radiation beam. The patterning device imparts the radiation beam with a pattern in its cross-section. The substrate holder holds a substrate. The projection system projects the patterned radiation beam onto a target portion of the substrate. The apparatus is constructed and arranged, at least in use, to image a pattern on to the substrate using radiation having: a bright field intensity distribution in a first direction; and a dark field intensity distribution in second direction, substantially perpendicular to the first direction.
    Type: Application
    Filed: July 16, 2012
    Publication date: February 21, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Heine Melle MULDER, Steven George Hansen, Thijs Johan Henry Hollink
  • ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20110310372
    Abstract: An illumination system having an array of individually controllable optical elements is disclosed, wherein each element is moveable between a plurality of orientations which may be selected in order to form desired illumination modes. The illumination system includes a controller to control orientation of one or more of the elements, the controller configured to apply force to the one or more elements which at least partially compensates for force applied to the one or more elements by a burst of radiation incident upon the one or more elements.
    Type: Application
    Filed: May 24, 2011
    Publication date: December 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bert Jan CLAESSENS, Heine Melle MULDER, Paul VAN DER VEEN, Wilfred Edward ENDENDIJK, Willem Jan BOUMAN, Bert Pieter VAN DRIEËNHUIZEN, Jozef Ferdinand Dymphna VERBEECK, Marc Hendricus Margaretha DASSEN, Thijs Johan Henry HOLLINK