Patents by Inventor Thijs KATER
Thijs KATER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11977326Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.Type: GrantFiled: April 12, 2019Date of Patent: May 7, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Dennis De Graaf, Richard Beaudry, Maxime Biron, Paul Janssen, Thijs Kater, Kevin Kornelsen, Michael Alfred Josephus Kuijken, Jan Hendrik Willem Kuntzel, Stephane Martel, Maxim Aleksandrovich Nasalevich, Guido Salmaso, Pieter-Jan Van Zwol
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Patent number: 11567399Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: GrantFiled: December 31, 2021Date of Patent: January 31, 2023Assignee: ASML Netherlands B.V.Inventors: Zomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
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Publication number: 20220121110Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: ApplicationFiled: December 31, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Zomer Silvester HOUWELING, Chaitanya Krishna ANDE, Dennis DE GRAAF, Thijs KATER, Michael Alfred Josephus KUIJKEN, Mahdiar VALEFI
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Patent number: 11237475Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: GrantFiled: November 6, 2018Date of Patent: February 1, 2022Assignee: ASML Netherlands B.V.Inventors: Zomer Silvester Houweling, Chaitanya Krishna Ande, Dennis De Graaf, Thijs Kater, Michael Alfred Josephus Kuijken, Mahdiar Valefi
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Publication number: 20210240070Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.Type: ApplicationFiled: April 12, 2019Publication date: August 5, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Dennis DE GRAAF, Richard BEAUDRY, Maxime BIRON, Paul JANSSEN, Thijs KATER, Kevin KORNELSEN, Michael Alfred Josephus KUIJKEN, Jan Hendrik Willem KUNTZEL, Stephane MARTEL, Maxim Aleksandrovich NASALEVICH, Guido SALMASO, Pieter-Jan VAN ZWOL
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Publication number: 20200341365Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.Type: ApplicationFiled: November 6, 2018Publication date: October 29, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Zomer Silvester HOUWELING, Chaitanya Krishna ANDE, Dennis DE GRAAF, Thijs KATER, Michael Alfred Josephus KUIJKEN, Mahdiar VALEFI