Abstract: In a known method for producing a raised marking on a glass object, a suspension containing SiO2 particles is applied to a surface of the glass object as a pattern, and the pattern is compacted to form the marking. Starting from this, in order to enable a cost-effective production of an optically appealing and uniform marking on an object made of quartz glass, which marking is also suited for applications at high temperature or in a contamination-sensitive environment, such as in solar cell and semiconductor production, it is suggested according to the invention that a binder-free suspension be used to create a marking on a quartz glass object, the suspension containing a dispersion liquid and amorphous SiO2 particles having particle sizes of up to a maximum of 500 ?m, of which are between 0.2% by wt. and 15% by wt. SiO2 nanoparticles having particle sizes of less than 100 nm, and the solids content thereof, i.e.