Patents by Inventor Thilo Eichler

Thilo Eichler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5936242
    Abstract: An analytical apparatus provides for the separation and analysis of a subset of ions from a mixture of ions in a gas. The apparatus includes an ion supply, such as an electrospray, which provides a population of variously charged ions. An analyzing chamber is coupled to the ion supply and includes a first wall with an inlet orifice for receiving the flow of variously charged ions, and a second wall opposed to the first wall. A laminar gas flow is established within the analyzing chamber along a flow axis. The second wall is provided with an outlet orifice that is displaced by a determined distance along the gas flow axis from the inlet orifice. A potential difference is applied between the first and second walls which causes the flow of ions, introduced via the inlet orifice, to migrate towards the outlet orifice.
    Type: Grant
    Filed: August 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Yale University
    Inventors: Juan Fernandez De La Mora, Luis De Juan, Thilo Eichler, Joan Rosell
  • Patent number: 5869831
    Abstract: An analytical apparatus provides for the separation and analysis of a subset of ions from a mixture of ions in a gas. The apparatus includes an ion supply, such as an electrospray, which provides a population of variously charged ions. An analyzing chamber is coupled to the ion supply and includes a first wall with an inlet orifice for receiving the flow of variously charged ions, and a second wall opposed to the first wall. A laminar gas flow is established within the analyzing chamber along a flow axis. The second wall is provided with an outlet orifice that is displaced by a determined distance along the gas flow axis from the inlet orifice. A potential difference is applied between the first and second walls which causes the flow of ions, introduced via the inlet orifice, to migrate towards the outlet orifice.
    Type: Grant
    Filed: June 24, 1997
    Date of Patent: February 9, 1999
    Assignee: Yale University
    Inventors: Juan Fernandez De La Mora, Luis De Juan, Thilo Eichler, Joan Rosell