Patents by Inventor Thimotheus Sengers

Thimotheus Sengers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132970
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Application
    Filed: June 8, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Roelof Ritsema, Frank Van Schaik, Thimotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070097343
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.
    Type: Application
    Filed: December 20, 2006
    Publication date: May 3, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thimotheus Sengers, Sjoerd Donders, Hans Jansen, Arjen Boogaard
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050041225
    Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of one or fewer metal types, long life of the sensor may be obtained.
    Type: Application
    Filed: July 12, 2004
    Publication date: February 24, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thimotheus Sengers, Sjoerd Nicolaas Donders, Hans Jansen, Arjen Boogaard