Patents by Inventor Thomai Zacharopoulou

Thomai Zacharopoulou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
    Patent number: 11604419
    Abstract: Methods of determining information about a patterning process. In a method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target includes at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further includes using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process, and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: March 14, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joannes Jitse Venselaar, Anagnostis Tsiatmas, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss, Gonzalo Roberto Sanguinetti, Thomai Zacharopoulou, Martijn Maria Zaal
  • Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
    Patent number: 11531274
    Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: December 20, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
  • METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHOD OF REDUCING ERROR IN MEASUREMENT DATA, METHOD OF CALIBRATING A METROLOGY PROCESS, METHOD OF SELECTING METROLOGY TARGETS
    Publication number: 20210255552
    Abstract: Methods of determining information about a patterning process. In a method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target includes at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further includes using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process, and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.
    Type: Application
    Filed: April 27, 2021
    Publication date: August 19, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes Jitse VENSELAAR, Anagnostis TSIATMAS, Samee Ur REHMAN, Paul Christiaan HINNEN, Jean-Pierre Agnes Henricus Marie VAESSEN, Nicolas Mauricio WEISS, Gonzalo Roberto SANGUINETTI, Thomai ZACHAROPOULOU, Martijn Maria ZAAL
  • METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHOD OF REDUCING ERROR IN MEASUREMENT DATA, METHOD OF CALIBRATING A METROLOGY PROCESS, METHOD OF SELECTING METROLOGY TARGETS
    Publication number: 20210191280
    Abstract: A recipe selection method includes obtaining measurements from metrology targets, metrology targets positioned on a semiconductor substrate, obtaining measurements from in-device targets, in-device targets positioned on the semiconductor substrate, and determining a recipe for accurate metrology using both metrology target measurements and in-device metrology measurements.
    Type: Application
    Filed: December 28, 2020
    Publication date: June 24, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Mariya Vyacheslavivna Medvedyeva, Maria Isabel De La Fuente Valentin, Martijn Jongen, Giulio Bottegal, Thomai Zacharopoulou
  • Method of determining information about a patterning process, method of reducing error in measurement data, method of calibrating a metrology process, method of selecting metrology targets
    Patent number: 11022897
    Abstract: Methods of determining information about a patterning process. In a method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target includes at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further includes using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process, and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Joannes Jitse Venselaar, Anagnostis Tsiatmas, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss, Gonzalo Roberto Sanguinetti, Thomai Zacharopoulou, Martijn Maria Zaal
  • METHOD OF DETERMINING INFORMATION ABOUT A PATTERNING PROCESS, METHOD OF REDUCING ERROR IN MEASUREMENT DATA, METHOD OF CALIBRATING A METROLOGY PROCESS, METHOD OF SELECTING METROLOGY TARGETS
    Publication number: 20190171115
    Abstract: Methods of determining information about a patterning process. In a method, measurement data from a metrology process applied to each of a plurality of metrology targets on a substrate is obtained. The measurement data for each metrology target includes at least a first contribution and a second contribution. The first contribution is from a parameter of interest of a patterning process used to form the metrology target. The second contribution is from an error in the metrology process. The method further includes using the obtained measurement data from all of the plurality of metrology targets to obtain information about an error in the metrology process, and using the obtained information about the error in the metrology process to extract a value of the parameter of interest for each metrology target.
    Type: Application
    Filed: November 19, 2018
    Publication date: June 6, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joannes Jitse VENSELAAR, Anagnostis Tsiatmas, Samee Ur Rehman, Paul Christiaan Hinnen, Jean-Pierre Agnes Henricus Marie Vaessen, Nicolas Mauricio Weiss, Gonzalo Roberto Sanguinetti, Thomai Zacharopoulou, Martijn Maria Zaal