Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: In order to improve the throughput performance and/or economy of a measurement apparatus, the present disclosure provides a metrology apparatus including: a first measuring apparatus; a second measuring apparatus; a first substrate stage configured to hold a first substrate and/or a second substrate; a second substrate stage configured to hold the first substrate and/or the second substrate; a first substrate handler configured to handle the first substrate and/or the second substrate; and a second substrate handler configured to handle the first substrate and/or the second substrate, wherein the first substrate is loaded from a first, second or third FOUP, wherein the second substrate is loaded from the first, second or third FOUP, wherein the first measuring apparatus is an alignment measuring apparatus, and wherein the second measuring apparatus is a level sensor, a film thickness measuring apparatus or a spectral reflectance measuring apparatus.

Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

Abstract: A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.

Abstract: A method to enable positioning of an object by a positioning device that includes an electromagnetic motor to control the position of the object in a lithographic apparatus, the method including receiving desired motor signals at the electromagnetic motor to produce a plurality of primary forces and a pitch torque associated with the primary forces within a motor control cycle, wherein for the motor control cycle, the pitch torque is based on either the primary forces to be generated by the electromagnetic motor or the desired forces and torques for positioning the object; and in response to the desired motor signals, causing the electromagnetic motor to generate the primary forces, wherein prior to the primary forces are determined for a next motor control cycle, the desired forces and torques for positioning the object are modified using the pitch torque associated with a previous motor control cycle.

Abstract: A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.

Abstract: A method to enable positioning of an object by a positioning device that includes an electromagnetic motor to control the position of the object in a lithographic apparatus, the method including receiving desired motor signals at the electromagnetic motor to produce a plurality of primary forces and a pitch torque associated with the primary forces within a motor control cycle, wherein for the motor control cycle, the pitch torque is based on either the primary forces to be generated by the electromagnetic motor or the desired forces and torques for positioning the object; and in response to the desired motor signals, causing the electromagnetic motor to generate the primary forces, wherein prior to the primary forces are determined for a next motor control cycle, the desired forces and torques for positioning the object are modified using the pitch torque associated with a previous motor control cycle.

Abstract: A method for positioning an object by an electromagnetic motor which, in use, produces a plurality of primary forces and a pitch torque associated with the primary forces. The method includes a cycle which includes: determining the desired forces and torques for positioning the object, determining the primary forces to be generated by the motor, determine the pitch torque from either the primary forces or from the desired forces and torques, determine the desired signals for the motor to generate the primary forces. In a next cycle, prior to the determination of the primary forces, the desired forces and torques for positioning the object are modified using the pitch torque determined in the previous cycle of steps.

Abstract: A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.

Abstract: A method for positioning an object by an electromagnetic motor which, in use, produces a plurality of primary forces and a pitch torque associated with the primary forces. The method includes a cycle which includes: determining the desired forces and torques for positioning the object, determining the primary forces to be generated by the motor, determine the pitch torque from either the primary forces or from the desired forces and torques, determine the desired signals for the motor to generate the primary forces. In a next cycle, prior to the determination of the primary forces, the desired forces and torques for positioning the object are modified using the pitch torque determined in the previous cycle of steps.

Abstract: A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.

Abstract: A piezo actuator system, is presented herein. A piezo actuator system comprises a number of piezo actuators which may lengthen and shear. Using the lengthening and shearing, the piezo actuator system grips and moves an object in response to a first and a second control signal, respectively. The possible displacement of the object is limited by the maximum shear of the piezo actuators. To increase the possible displacement, the piezo actuators may be controlled to perform a linear shear sequence or a shuffle sequence. During the linear shear sequence, the object is moved; during the shuffle sequence the object is substantially stationary, while the piezo actuators are repositioned with respect to the object, after which the object may be moved further using the linear shear sequence.

Abstract: A piezo actuator system, is presented herein. A piezo actuator system comprises a number of piezo actuators which may lengthen and shear. Using the lengthening and shearing, the piezo actuator system grips and moves an object in response to a first and a second control signal, respectively. The possible displacement of the object is limited by the maximum shear of the piezo actuators. To increase the possible displacement, the piezo actuators may be controlled to perform a linear shear sequence or a shuffle sequence. During the linear shear sequence, the object is moved; during the shuffle sequence the object is substantially stationary, while the piezo actuators are repositioned with respect to the object, after which the object may be moved further using the linear shear sequence.