Patents by Inventor Thomas Bramblett

Thomas Bramblett has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Rinse apparatus and method for wafer polisher
    Patent number: 7021999
    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
    Type: Grant
    Filed: April 5, 2005
    Date of Patent: April 4, 2006
    Assignee: Intel Corporation
    Inventors: Lei Jiang, Jin Liu, Sadasivan Shankar, Thomas Bramblett
  • Rinse apparatus and method for wafer polisher
    Publication number: 20050181709
    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
    Type: Application
    Filed: April 5, 2005
    Publication date: August 18, 2005
    Inventors: Lei Jiang, Jin Liu, Sadasivan Shankar, Thomas Bramblett
  • Rinse apparatus and method for wafer polisher
    Patent number: 6908370
    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
    Type: Grant
    Filed: December 4, 2003
    Date of Patent: June 21, 2005
    Assignee: Intel Corporation
    Inventors: Lei Jiang, Jin Liu, Sadasivan Shankar, Thomas Bramblett
  • RINSE APPARATUS AND METHOD FOR WAFER POLISHER
    Publication number: 20050124267
    Abstract: An apparatus for polishing a wafer comprising a rotatable polishing pad having a center of rotation and a rinse delivery conduit positioned adjacent to the polishing pad and substantially in radial alignment with the center. The rinse delivery conduit includes a plurality of nozzles to dispense a rinsing liquid. In one embodiment, the plurality of nozzles are configured and positioned to generate a higher flow rate of the rinsing liquid at the end of the rinse delivery conduit proximate to the center than at the end of the rinse delivery conduit distal to the center. In another embodiment, the rinse delivery conduit has a proximal end which is substantially adjacent the center and the distal end which is approximately adjacent an outer periphery of the pad.
    Type: Application
    Filed: December 4, 2003
    Publication date: June 9, 2005
    Inventors: Lei Jiang, Jin Liu, Sadasivan Shankar, Thomas Bramblett