Patents by Inventor Thomas C. Sutter

Thomas C. Sutter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inhibiting background plating
    Patent number: 9206520
    Abstract: Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.
    Type: Grant
    Filed: July 31, 2009
    Date of Patent: December 8, 2015
    Inventors: Robert K. Barr, Hua Dong, Thomas C. Sutter
  • Method for forming metal contacts
    Patent number: 8536049
    Abstract: Methods of forming metal contacts with metal inks in the manufacture of photovoltaic devices are disclosed. The metal inks are selectively deposited on semiconductor coatings by inkjet and aerosol apparatus. The composite is heated to selective temperatures where the metal inks burn through the coating to form an electrical contact with the semiconductor. Metal layers are then deposited on the electrical contacts by light induced or light assisted plating.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: September 17, 2013
    Assignees: Rohm and Haas Electronic Materials LLC, Alliance for Sustainable Energy, LLC
    Inventors: Erik Reddington, Thomas C. Sutter, Lujia Bu, Alexandra Cannon, Susan E. Habas, Calvin J. Curtis, Alexander Miedaner, David S. Ginley, Marinus Franciscus Antonius Maria Van Hest
  • Hot melt compositions
    Patent number: 8252506
    Abstract: Hot melt compositions include acid waxes and acrylate functional monomers free of acid groups. Upon application of actinic radiation, the hot melt compositions cure to form and etch resist. The hot melt compositions may be used in the manufacture of printed circuit boards, optoelectronic and photovoltaic devices.
    Type: Grant
    Filed: November 4, 2009
    Date of Patent: August 28, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin J. Cheetham, Thomas C. Sutter
  • METHOD FOR FORMING METAL CONTACTS
    Publication number: 20120129332
    Abstract: Methods of forming metal contacts with metal inks in the manufacture of photovoltaic devices are disclosed. The metal inks are selectively deposited on semiconductor coatings by inkjet and aerosol apparatus. The composite is heated to selective temperatures where the metal inks burn through the coating to form an electrical contact with the semiconductor. Metal layers are then deposited on the electrical contacts by light induced or light assisted plating.
    Type: Application
    Filed: October 14, 2011
    Publication date: May 24, 2012
    Applicants: Alliance for Sustainable Energy, LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Erik REDDINGTON, Thomas C. Sutter, Lujia Bu, Alexandra Perras, Susan E. Habas, Calvin J. Curtis, Alexander Miedaner, David S. Ginley, Marinus Franciscus Antonius Maria Van Hest
  • Hot melt compositions
    Publication number: 20100129754
    Abstract: Hot melt compositions include acid waxes and acrylate functional monomers free of acid groups. Upon application of actinic radiation, the hot melt compositions cure to form and etch resist. The hot melt compositions may be used in the manufacture of printed circuit boards, optoelectronic and photovoltaic devices.
    Type: Application
    Filed: November 4, 2009
    Publication date: May 27, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin J. Cheetham, Thomas C. Sutter
  • Inhibiting background plating
    Publication number: 20100029077
    Abstract: Methods include selectively depositing a phase change resist having high light transmittance onto a dielectric to form a pattern, etching away portions of the dielectric not covered by the resist and depositing a metal seed layer on the etched portions of the dielectric. A metal layer is then deposited on the metal seed layer by light induced plating.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 4, 2010
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Hua Dong, Thomas C. Sutter
  • Mask
    Patent number: 7632621
    Abstract: A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.
    Type: Grant
    Filed: December 23, 2004
    Date of Patent: December 15, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edgardo Anzures, Robert K. Barr, Thomas C. Sutter