Abstract: A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:(a) spin coating a photoresist solution onto a surface of a substrate, thereby applying a photoresist coating which comprises a uniform film over substantially all of said substrate surface except for unwanted photoresist material deposits at the peripheral areas of said surface;(b) contacting said peripheral area of the coated substrate with a sufficient amount of a solvent mixture comprising a mixture of ethyl lactate and methyl ethyl ketone present in a volume ratio of about 65:35 to about 25:75, respectively, to selectively dissolve said unwanted deposits without adversely affecting said uniform film; and(c) separating said dissolved deposits from said coated substrate.

Abstract: A light-sensitive composition comprising an admixture of:(a) at least one alkali-soluble binder resin;(b) at least one photoactive compound;(c) a sufficient amount of a solvent mixture comprising ehtyl lactate and ethyl 3-ethoxy propionate to dissolve (a) and (b);wherein the amount of said binder resin is from about 60% to 95% by weight, the amount of said photoactive compound is from about 5% to about 40% by weight, both based on the total solids content of said light-sensitive composition, and wherein the weight ratio of ethyl lactate to ethyl 3-ethoxy propionate is from about 30:70 to 80:20.

Abstract: A light-sensitive composition comprising an admixture of:(a) at least one alkali-soluble binder resin;(b) at least one photoactive compound;(c) a sufficient amount of a solvent mixture comprising ethyl lactate and ethyl 3-ethoxy propionate to dissolve (a) and (b);wherein the amount of said binder resin is from about 60% to 95% by weight, the amount of said photoactive compound is from about 5% to about 40% by weight, both based on the total solids content of said light-sensitive composition, and wherein the weight ratio of ethyl lactate to ethyl 3-epoxy propionate is from about 30:70 to 80:20.

Abstract: A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:(a) spin coating a photoresist solution onto a surface of a substrate, thereby applying a photoresist coating which comprises a uniform film over substantially all of said substrate surface except for unwanted photoresist material deposits at the peripheral areas of said surface;(b) contacting said peripheral area of the coated substrate with a sufficient amount of a solvent mixture comprising a mixture of ethyl lactate and methyl ethyl ketone present in a volume ratio of about 65:35 to about 25:75, respectively, to selectively dissolve said unwanted deposits without adversely affecting said uniform film; and(c) separating said dissolved deposits from said coated substrate.

Abstract: Oxidation inhibiting amounts of alkylated diphenyl oxide disulfonates are incorporated into photographic color developers containing primary aromatic amino color developing agents to increase clarity and inhibit the formation of tar-like precipitates in these developers. Typical disulfonates include sodium dodecyl diphenyl ether disulfonate, sodium decyl diphenyl ether disulfonate, sodium cetyl diphenyl ether disulfonate, monocetyl diphenyl ether disulfonate, dicetyl diphenyl ether disulfonate and mixtures thereof. The use of disulfonates of this type substantially eliminates the need for cosolvents such as alkanolamines to inhibit the formation of tar-like particles in the developers.