Patents by Inventor Thomas Eisenhammer

Thomas Eisenhammer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11022733
    Abstract: An optical filter having a substrate including a primary bandpass filter at least predominantly on an interference basis and a secondary bandpass filter at least predominantly on an interference basis. Both bandpass filters are designed such that they transmit sufficiently over the entire required angle range in the desired spectral transmittance wavelength interval. The primary bandpass filter contains the small angle shift required by the overall system. It also has a spectral transmittance wavelength interval which is as small as possible according to the requirements of the respective application and restricted by narrow blocking bands. The secondary bandpass filter is designed such that its transmittance wavelength interval is limited by a short-wave edge and a long-wave edge and is adjusted to the primary bandpass filter in such a way that its edges shift over the required angle range only within the blocking bands of the primary bandpass filter.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: June 1, 2021
    Assignee: OPTICS BALZERS AG
    Inventor: Thomas Eisenhammer
  • Publication number: 20200408977
    Abstract: An optical filter having a substrate including a primary bandpass filter at least predominantly on an interference basis and a secondary bandpass filter at least predominantly on an interference basis. Both bandpass filters are designed such that they transmit sufficiently over the entire required angle range in the desired spectral transmittance wavelength interval. The primary bandpass filter contains the small angle shift required by the overall system. It also has a spectral transmittance wavelength interval which is as small as possible according to the requirements of the respective application and restricted by narrow blocking bands. The secondary bandpass filter is designed such that its transmittance wavelength interval is limited by a short-wave edge and a long-wave edge and is adjusted to the primary bandpass filter in such a way that its edges shift over the required angle range only within the blocking bands of the primary bandpass filter.
    Type: Application
    Filed: November 29, 2017
    Publication date: December 31, 2020
    Inventor: Thomas Eisenhammer
  • Publication number: 20080053620
    Abstract: A first substrate (11a) is positioned on a support surface (7) in a vacuum chamber with an upward-facing first bonding surface (12a) spin-coated with adhesive while a second substrate (11b) is held with downward-facing second bonding surface (12b) to a cover (3) by suction. While the vacuum chamber is being evacuated to a pressure of between 0.1 mbar and 2 mbar, a support pin (9) is extended through central openings (14a, 14b) of the substrates (11a, 11b) and then retracted with the second substrate (11b) released from the cover (3) and carried by radially extended balls (10). The support pin (9) is lowered to a position where the balls (10), acting against the first bonding surface (12a), deform the first substrate (11a). The first bonding surface (12a) being therefore slightly concave, the first and second bonding surfaces (12a, 12b) only touch close to their circumferences.
    Type: Application
    Filed: November 2, 2007
    Publication date: March 6, 2008
    Applicant: OC Oerlikon Balzers AG
    Inventors: Thomas Eisenhammer, Jeff Ou-Yang
  • Patent number: 7335521
    Abstract: A Method for manufacturing an optical disc substrate comprises a first substrate with at least one structured surface, on which an anti-adhesive layer, preferably carbon, is deposited and first layer on top of said anti-adhesive layer. On a second substrate with a structured surface also a layer is deposited. Both substrates are bonded together with the layers facing each other. The separation now easily can take place afterwards alongside the adhesive layer. This way the first layer from the first substrate is being transferred to the second substrate.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: February 26, 2008
    Assignee: OC Oerlikon Balzers AG
    Inventors: Martin Dubs, Wolfgang Nutt, Helfried Weinzerl, Thomas Eisenhammer
  • Patent number: 7311795
    Abstract: A first substrate (11a) is positioned on a support surface (7) in a vacuum chamber with an upward-facing first bonding surface (12a) spin-coated with adhesive while a second substrate (11b) is held with downward-facing second bonding surface (12b) to a cover (3) by suction. While the vacuum chamber is being evacuated to a pressure of between 0.1 mbar and 2 mbar, a support pin (9) is extended through central openings (14a, 14b) of the substrates (11a, 11b) and then retracted with the second substrate (11b) released from the cover (3) and carried by radially extended balls (10). The support pin (9) is lowered to a position where the balls (10), acting against the first bonding surface (12a), deform the first substrate (11a). The first bonding surface (12a) being therefore slightly concave, the first and second bonding surfaces (12a, 12b) only touch close to their circumferences.
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: December 25, 2007
    Assignee: OC Oerlikon Balzers AG
    Inventors: Thomas Eisenhammer, Jeff Ou-Yang
  • Patent number: 7019264
    Abstract: This invention relates to a system and a method for the heat treatment of substrates, incorporating an annular heat-treatment section with a rotary table designed to accept substrate holders, at least two of which substrate holders are positioned one behind the other in heat-treatment zones that extend in a radial spoke pattern around the center of the rotary table.
    Type: Grant
    Filed: April 6, 2004
    Date of Patent: March 28, 2006
    Assignee: Unaxis Balzers Ltd.
    Inventors: Thomas Eisenhammer, Thomas Matt, Gebhard Stittmatter, Klaus Zapf
  • Publication number: 20060003476
    Abstract: A Method for manufacturing an optical disc substrate comprises a first substrate with at least one structured surface, on which an anti-adhesive layer, preferably carbon, is deposited and first layer on top of said anti-adhesive layer. On a second substrate with a structured surface also a layer is deposited. Both substrates are bonded together with the layers facing each other. The separation now easily can take place afterwards alongside the adhesive layer. This way the first layer from the first substrate is being transferred to the second substrate.
    Type: Application
    Filed: June 28, 2005
    Publication date: January 5, 2006
    Applicant: Unaxis Balzers Ltd.
    Inventors: Martin Dubs, Wolfgang Nutt, Helfried Weinzerl, Thomas Eisenhammer
  • Publication number: 20050269028
    Abstract: A method and device for manufacturing a disc-shaped workpiece comprises the steps of producing a first and second disc-shaped substrate, applying an adhesive on at least one of the flat sides of said first and second substrates, bonding said substrates to form said disc-shaped workpiece and removing an excess of adhesive at the outer rim of the disc shaped workpiece by means of a liquid while rotating the workpiece on a rotating table. The liquid is being dispensed by a supply system comprising one or severeal nozzles, used liquid is collected by a suction device.
    Type: Application
    Filed: May 13, 2005
    Publication date: December 8, 2005
    Inventors: Thomas Eisenhammer, Bernd Heinz, Roger Loow, Cem Yavaser
  • Patent number: 6860977
    Abstract: A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.
    Type: Grant
    Filed: November 6, 2003
    Date of Patent: March 1, 2005
    Assignee: Unaxis Balzers Limited
    Inventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
  • Publication number: 20050039841
    Abstract: A first substrate (11a) is positioned on a support surface (7) in a vacuum chamber with an upward-facing first bonding surface (12a) spin-coated with adhesive while a second substrate (11b) is held with downward-facing second bonding surface (12b) to a cover (3) by suction. While the vacuum chamber is being evacuated to a pressure of between 0.1 mbar and 2 mbar, a support pin (9) is extended through central openings (14a, 14b) of the substrates (11a, 11b) and then retracted with the second substrate (11b) released from the cover (3) and carried by radially extended balls (10). The support pin (9) is lowered to a position where the balls (10), acting against the first bonding surface (12a), deform the first substrate (11a). The first bonding surface (12a) being therefore slightly concave, the first and second bonding surfaces (12a, 12b) only touch close to their circumferences.
    Type: Application
    Filed: March 18, 2004
    Publication date: February 24, 2005
    Applicant: Unaxis Balzers AG
    Inventors: Thomas Eisenhammer, Jeff Ou-Yang
  • Publication number: 20050035108
    Abstract: This invention relates to a system and a method for the heat treatment of substrates, incorporating an annular heat-treatment section with a rotary table designed to accept substrate holders, at least two of which substrate holders are positioned one behind the other in heat-treatment zones that extend in a radial spoke pattern around the center of the rotary table.
    Type: Application
    Filed: April 6, 2004
    Publication date: February 17, 2005
    Inventors: Thomas Eisenhammer, Thomas Matt, Gebhard Strittmatter, Klaus Zapf
  • Publication number: 20040149565
    Abstract: A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.
    Type: Application
    Filed: November 6, 2003
    Publication date: August 5, 2004
    Applicant: Unaxis Balzers Limited
    Inventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
  • Patent number: 6682637
    Abstract: To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face 20 in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole 3 of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole 4 with a second outer pole part 11 is developed rotatable about the central source axis 6.
    Type: Grant
    Filed: June 4, 2002
    Date of Patent: January 27, 2004
    Assignee: Unaxis Balzers Limited
    Inventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
  • Publication number: 20030136671
    Abstract: To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face 20 in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole 3 of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole 4 with a second outer pole part 11 is developed rotatable about the central source axis 6.
    Type: Application
    Filed: June 4, 2002
    Publication date: July 24, 2003
    Inventors: Bernd Heinz, Martin Dubs, Thomas Eisenhammer, Pius Grunenfelder, Walter Haag, Stanislav Kadlec, Siegfried Krassnitzer
  • Patent number: 5912045
    Abstract: This invention relates to a process for producing a selective absorber which contains one or more layers of a non-homogeneous material (cermet), the non-homogeneous material having been produced by means of a sol-gel process.
    Type: Grant
    Filed: November 21, 1997
    Date of Patent: June 15, 1999
    Inventors: Thomas Eisenhammer, Helmut Schellinger, Miladin Lazarov