Patents by Inventor Thomas Eugene Doane

Thomas Eugene Doane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Post-lapping cleaning process for silicon wafers
    Patent number: 5837662
    Abstract: A process for cleaning contaminants from the surface of a semiconductor wafer after the wafer has been lapped. The process comprises contacting the wafer with an oxidizing agent to oxidize organic contaminants which may be present on the surface of the wafer. The wafer is then immersed in an aqueous bath comprising citric acid into which sonic energy is being directed to remove metallic contaminants which may be present on the surface of the wafer. After being immersed in the citric acid bath, the wafer is contacted with hydrofluoric acid to remove a layer of silicon dioxide which may be present on the surface of the wafer. The wafer is then immersed in an aqueous bath comprising an alkaline component and a surfactant, and into which sonic energy is being directed.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: November 17, 1998
    Assignee: MEMC Electronic Materials, Inc.
    Inventors: Jing Chai, Henry F. Erk, Judith Ann Schmidt, Thomas Eugene Doane