Abstract: A device to facilitate filling a reusable bag, a conventional trash bag or a receptacle. The device and bag or receptacle are used horizontally. The device comprises a funneled receiver, channel, stakes, and optionally four legs. The receiver is a scoop-like device having semi-frusto-conical cross-sections. The channel is a non-funneled extension of the receiver, having trapezoidal cross-sections. If a bag is used, the device facilitates filling the bag and it also holds open the bag. The optional four legs also hold open the body of the bag and, by contributing to the stability of the device, they allow the device to be smaller and lighter than otherwise. The device is normally placed on the ground, and inserted into either the bag or the receptacle. Leaves, grass clippings and other debris are raked or otherwise projected through the front of the receiver. The front of the receiver has a turned-over lip that facilitates filling the bag and that also acts as a handle.

Abstract: A device to facilitate filling a reusable bag, a conventional trash bag or a receptacle. The device and bag or receptacle are used horizontally. The device comprises a funneled receiver, channel, stakes, and optionally four legs. The receiver is a scoop-like device having semi-frusto-conical cross-sections. The channel is a non-funneled extension of the receiver, having trapezoidal cross-sections. If a bag is used, the device facilitates filling the bag and it also holds open the bag. The optional four legs also hold open the body of the bag and, by contributing to the stability of the device, they allow the device to be smatter and lighter than otherwise. The device is normally placed on the ground, and inserted into either the bag or the receptacle. Leaves, grass clippings and other debris are raked or otherwise projected through the front of the receiver. The front of the receiver has a turned-over lip that facilitates fitting the bag and that also acts as a handle.

Abstract: Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

Abstract: Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

Abstract: Reaction gases are prevented from escaping from a reaction chamber through the use of flexible or gas seals between the interface of the reaction chamber and the junction used to connected successive reaction chambers.

Abstract: A carrier for use in a continuous chemical vapor deposition reactor system has a lid with tapered edges which match the sides of a recess in the carrier in which the lid resides during processing of the semiconductor to provide a precise fit for the lid and to minimize thermal stresses in the carrier, the lid and the lid-carrier assembly due to extreme heat during processing of the semiconductor wafer.

Abstract: Gas flow structures are described for the inputting and exhausting of gases for a continuous vapor deposition reactor to cause an even flow of gases within the reactor chamber and to prevent the deposition of reaction material on the walls of the reactor chamber. Gas inlet and exhaust port structures are provided for multiple-chamber chemical vapor deposition reactors having gas input and exhaust junctions, wherein the ports may include, in order to provide uniform flow, baffles or a plurality of orifices with or without shutters. Two vertically spaced gas inlets may be used, wherein gas from a second inlet prevents deposition on the reactor chamber from gases introduced through the first inlet.

Abstract: A track system is used in a continuous chemical deposition reaction system to guide semiconductor wafer carriers through a plurality of interconnected reaction chambers to position the carriers in each reaction chamber, and to prevent wear to the bottom of the reactor chambers.

Abstract: A heating lamp assembly for use with semiconductor reactors has a reflector assembly constructed of tubes joined together by heat conductive spacers to provide for water cooling of the reflector assembly, has mounting pins for providing variable spacing of heating lamps, and water manifolds on each side of the reflector assembly for directing water through the cooling tubes. One or more blocking gates are mounted on the lamp mounting pins to direct cooling air flow across the heating lamps.