Abstract: "Key icons in a graphical user interface for a computer system resemble physical keys on the keyboard and are closely integrated with the functionalities they invoke. A desired functionality may be invoked by pointing and clicking the associated key icon, or by physically pressing the corresponding key on the keyboard. In either case, the key icon changes its appearance to resemble a depressed key in response to the pressing of the physical key or to selecting the key icon. Key icons may invoke a menu function.

Abstract: The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed photoresist coating over an integrated circuit substrate where the photoresist contains an essentially unreacted acid activated cross linking agent, and subjecting said substrate to an etching plasma in a gaseous stream that contains a Lewis acid. Contact of the surface of the photoresist film with the Lewis acid causes cross linking of the surface of the photoresist film during plasma etching with the formation of a reticulation resistant surface layer.

Abstract: A compound bow having improved performance and durability is constructed with buss cables and bowstring made of the same substantially non-stretchable material, a preferred material being a polyethylene fiber material such as that known as "Spectra" material. The buss cables and bowstring each form a continuous length with looped ends. The eccentrics of the bow each provide for the separate direct securement of a looped end of a buss cable and a looped end of a bowstring.

Abstract: The invention provides a method for forming a photoresist mask on a substrate resistant to reticulation during plasma etching. The method comprises the steps of forming an imaged and developed photoresist coating over an integrated circuit substrate where the photoresist contains an essentially unreacted acid activated cross linking agent, and subjecting said substrate to an etching plasma in a gaseous stream that contains a Lewis acid. Contact of the surface of the photoresist film with the Lewis acid causes cross linking of the surface of the photoresist film during plasma etching with the formation of a reticulation resistant surface layer.