Patents by Inventor Thomas G. Bifano

Thomas G. Bifano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7929195
    Abstract: A deformable reflective surface is disclosed that may be used with a retroreflector to provide a modulated retroreflector. The modulated retroreflector may be used in communication systems such as optical laser communication systems wherein an incident beam is reflected back to the source, as modulated by the modulated retroreflector. The deformable reflective surface uniformly reflects or disperses an incident light, depending on a deformation state of the surface. The different states of the deformable reflective surface permits modulation of the reflected beam, based on an input modulation signal that can contain voice or sensor data, for example. A sensor may be used to sense the incident beam and activate the retroreflector. The deformable reflective surface may be arranged to be switched between a diffractive reflective surface and a uniform reflective surface.
    Type: Grant
    Filed: November 10, 2005
    Date of Patent: April 19, 2011
    Assignee: Trustees of Boston University
    Inventor: Thomas G. Bifano
  • Patent number: 6929721
    Abstract: Method and apparatus for reducing the curvature of a micromachined structure having lamella (12). Surface treatment by an ion beam (30) of the lamella (12) such as by sputtering removes regions of stress allowing the lamella (12) to return to a planar condition. The resulting outer surface is made suitable for use as a reflector and other purposes needing a substantially planar surface.
    Type: Grant
    Filed: June 20, 2002
    Date of Patent: August 16, 2005
    Assignee: The Trustees of Boston University
    Inventor: Thomas G. Bifano
  • Publication number: 20020155635
    Abstract: Method and apparatus for reducing the curvature of a micromachined structure having lamella (12). Surface treatment by an ion beam (30) of the lamella (12) such as by sputtering removes regions of stress allowing the lamella (12) to return to a planar condition. The resulting outer surface is made suitable for use as a reflector and other purposes needing a substantially planar surface.
    Type: Application
    Filed: June 20, 2002
    Publication date: October 24, 2002
    Applicant: THE TRUSTEES OF BOSTON UNIVERSITY
    Inventor: Thomas G. Bifano
  • Patent number: 5783371
    Abstract: A process for manufacturing an optical data storage disk stamper includes the steps of providing an amorphous electroless nickel substrate including phosphorous in the amount in a range of about 5 to 15 percent by weight having a toughness of about 100 MPa.sqroot. m, a roughness in a range of about 1 to 50 nm, and a flatness of about 6 .mu.m and depositing a negative photoresist on a surface of the substrate. The substrate has a diameter greater than about 120 mm and a thickness greater than about 300 .mu.m. The negative photoresist then is exposed with a laser to form a negative, data pattern in the photoresist. The photoresist is developed, and the ceramic substrate is ion machined to form the data pattern, in the substrate, such that a spiral track of ridges and lands is formed wherein each ridge has a height of less than about 150 nm. After the data pattern has been ion machined into the substrate, the developed photoresist is stripped from the substrate.
    Type: Grant
    Filed: April 1, 1996
    Date of Patent: July 21, 1998
    Assignees: Trustees of Boston University, Peter Ciriello
    Inventor: Thomas G. Bifano
  • Patent number: 5503963
    Abstract: A process for manufacturing an optical data storage disk stamper includes the steps of providing a chemically vapor-deposited, silicon carbide substrate having a toughness of about 4.5 MPa.sqroot. m, a roughness of about 1 nm, and a flatness of about 6 .mu.m and depositing a negative photoresist on a surface of the substrate. The substrate has a diameter greater than about 120 mm and a thickness greater than about one mm. The negative photoresist then is exposed with a laser to form a negative, data pattern in the photoresist. The photoresist is developed, and the ceramic substrate is ion machined to form the data pattern, in the substrate, such that a spiral track of ridges and lands is formed wherein each ridge has a height of about in a range of 20 to 200 nm. After the data pattern has been ion machined into the substrate, the developed photoresist is stripped from the substrate.
    Type: Grant
    Filed: July 29, 1994
    Date of Patent: April 2, 1996
    Assignee: The Trustees of Boston University
    Inventor: Thomas G. Bifano