Patents by Inventor Thomas Gyulai

Thomas Gyulai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POST-POLISH WAFER CLEANING
    Publication number: 20170178918
    Abstract: An apparatus for semiconductor wafer treatment is provided including a polishing stage configured for polishing a surface of the semiconductor wafer, a rinse stage configured for cleaning the surface of the semiconductor wafer and a mixer connected with the rinse stage and configured for supplying a mixture of at least deionized water and an inert gas to the rinse stage.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 22, 2017
    Inventor: Thomas Gyulai
  • Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor
    Patent number: 7198542
    Abstract: In a system and a method according to the present invention, a seismic signal from a seismic sensor coupled to a drive assembly of a pad conditioning system is used to estimate the status of one or more consumables in a CMP system.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: April 3, 2007
    Assignee: Advanced Micro Devices, Inc,
    Inventors: Jens Kramer, Thomas Gyulai, Arwed Reichel
  • Method and system for controlling the chemical mechanical polishing by using a seismic signal of a seismic sensor
    Publication number: 20050142987
    Abstract: In a system and a method according to the present invention, a seismic signal from a seismic sensor coupled to a drive assembly of a pad conditioning system is used to estimate the status of one or more consumables in a CMP system.
    Type: Application
    Filed: November 12, 2004
    Publication date: June 30, 2005
    Inventors: Jens Kramer, Thomas Gyulai, Arwed Reichel