Patents by Inventor Thomas H. Pang
Thomas H. Pang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7077638Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: GrantFiled: November 26, 2003Date of Patent: July 18, 2006Assignee: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J. L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Publication number: 20040075196Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: ApplicationFiled: November 26, 2003Publication date: April 22, 2004Applicant: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J.L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Patent number: 6660209Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: GrantFiled: August 6, 2001Date of Patent: December 9, 2003Assignee: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J. L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Patent number: 6508971Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: GrantFiled: August 6, 2001Date of Patent: January 21, 2003Assignee: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J. L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Publication number: 20020177073Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.Type: ApplicationFiled: June 13, 2002Publication date: November 28, 2002Inventors: Anastasios P. Melisaris, Wang Renyi, Thomas H. Pang
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Publication number: 20020160309Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.Type: ApplicationFiled: May 14, 2002Publication date: October 31, 2002Applicant: VANTICO INC.Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong
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Patent number: 6413696Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.Type: GrantFiled: June 22, 2000Date of Patent: July 2, 2002Assignee: Vantico Inc.Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong
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Patent number: 6413697Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.Type: GrantFiled: August 25, 2000Date of Patent: July 2, 2002Assignee: Vantico AT&T US Inc.Inventors: Anastasios P. Melisaris, Wang Renyi, Thomas H Pang
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Patent number: 6350403Abstract: The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition comprising a mixture of at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material and at least one photoinitiator for cationic and/or radical polymerization. An organic viscosity stabilizer material may be brought into contact with the composition to substantially delay or prevent undesirable viscosity increase and subsequently premature polymerization. A filler material is optionally added to the composition in an effective amount to at least delay or prevent a significant increase in viscosity and polymerization. The process is particularly suitable for stabilizing resins in stereolithography baths.Type: GrantFiled: May 31, 2000Date of Patent: February 26, 2002Assignee: Vantico Inc.Inventors: Anastasios P. Melisaris, Stephen D. Hanna, Thomas H. Pang
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Publication number: 20020011693Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: ApplicationFiled: August 6, 2001Publication date: January 31, 2002Applicant: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J.L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Publication number: 20020008335Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: ApplicationFiled: August 6, 2001Publication date: January 24, 2002Applicant: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J.L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Patent number: 6270335Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: GrantFiled: February 18, 1999Date of Patent: August 7, 2001Assignee: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J. L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang
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Patent number: 6264873Abstract: An improved method for stereolithographically making an object by alternating the order in which similar sets of vectors are exposed over two or more layers. In another method, a pattern of tightly packed hexagonal tiles are drawn. Each tile is isolated from its neighboring tiles by specifying breaks of unexposed material between the tiles. Using an interrupted scan method, vectors are drawn with periodic breaks along their lengths. In another method, modulator and scanning techniques are used to reduce exposure problems associated with the acceleration and deceleration of the scanning system when jumping between vectors or changing scanning directions. In another method, a capability for automatically inserting vents an drains into a three-dimensional object representation is provided.Type: GrantFiled: September 24, 1999Date of Patent: July 24, 2001Assignee: 3D Systems, Inc.Inventors: John J. Gigl, Dennis R. Smalley, Jan Richter, Thomas H. Pang, Kerry J. Allen, Chris R. Manners, Paul F. Jacobs, Hop D. Hguyen, Charles W. Hull, Richard N. Leyden
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Patent number: 6261507Abstract: An improved method for stereolithographically making an object by alternating the order in which similar sets of vectors are exposed over two or more layers. In another method, a pattern of tightly packed hexagonal tiles are drawn. Each tile is isolated from its neighboring tiles by specifying breaks of unexposed material between the tiles. Using an interrupted scan method, vectors are drawn with periodic breaks along their lengths. In another method, modulator and scanning techniques are used to reduce exposure problems associated with the acceleration and deceleration of the scanning system when jumping between vectors or changing scanning directions. In another method, a capability for automatically inserting vents an drains into a three-dimensional object representation is provided.Type: GrantFiled: September 24, 1999Date of Patent: July 17, 2001Assignee: 3D Systems, Inc.Inventors: John J. Gigl, Dennis R. Smalley, Thomas H. Pang, Kerry J. Allen, Paul F. Jacobs, Hop D. Nguyen, Charles W. Hull, Richard N. Leyden
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Publication number: 20010003004Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: ApplicationFiled: February 18, 1999Publication date: June 7, 2001Inventors: RICHARD N. LEYDEN, JEFFREY S. THAYER, BRYAN J. L. BEDAL, THOMAS A. ALMQUIST, CHARLES W. HULL, JOCELYN M. EARL, THOMAS A. KEREKES, CHRISTIAN M. MEROT, RICHARD P. FEDCHENKO, MICHAEL S. LOCKARD, THOMAS H. PANG
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Patent number: 6193923Abstract: A variety of support structures and build styles for use in Rapid Prototyping and Manufacturing systems are described wherein particular emphasis is given to Thermal Stereolithography, Fused Deposition Modeling, and Selective Deposition Modeling systems, and wherein a 3D modeling system is presented which uses multijet dispensing and a single material for both object and support formation.Type: GrantFiled: July 14, 1999Date of Patent: February 27, 2001Assignee: 3D Systems, Inc.Inventors: Richard N. Leyden, Jeffrey S. Thayer, Bryan J. L. Bedal, Thomas A. Almquist, Charles W. Hull, Jocelyn M. Earl, Thomas A. Kerekes, Dennis R. Smalley, Christian M. Merot, Richard P. Fedchenko, Michael S. Lockard, Thomas H. Pang, Dinh Ton That
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Patent number: 6177232Abstract: The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition containing a mixture of at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material, at least one photoinitiator for cationic and/or radical polymerizations and at least one antisedimentation agent. An organic viscosity stabilizer material soluble in the base resin may optionally be brought into contact with the composition. A filler material can be introduced in the composition in an effective amount sufficient to at least delay or prevent a significant viscosity increase. The present invention also relates to cured articles resulting from said processes and a process for preparing said compositions.Type: GrantFiled: July 14, 1998Date of Patent: January 23, 2001Assignee: Vantico Inc.Inventors: Anastasios P. Melisaris, Thomas H. Pang
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Patent number: 6136497Abstract: The present invention relates to stereolithographic compositions containing an actinic radiation-curable and cationically polymerizable organic substance, a cationic initiator, a radical photoinitiator, and at least one cationic reactive modifier containing at least two reactive groups per molecule or at least one polyether polyol or mixtures thereof. The cationic reactive modifier has at least one chain extension segment with a molecular weight of at least about 100 and not more than about 2,000. The polyether polyol has a molecular weight greater than or equal to about 4,000. The use of the cationically reactive modifiers and polyether polyol modifiers substantially increases the flexibility and toughness of the cured articles without compromising photospeed, accuracy and wetting-recoatability of the compositions. The present invention further relates to a method of producing a cured product, particularly three-dimensional shaped articles by treating the composition described above with actinic radiation.Type: GrantFiled: March 30, 1998Date of Patent: October 24, 2000Assignee: Vantico, Inc.Inventors: Anastasios P. Melisaris, Wang Renyi, Thomas H Pang
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Patent number: 6099787Abstract: The present invention relates to a process for the production of three-dimensional articles by stereolithography using a radiation-curable composition having at least one cationically polymerizable compound and/or at least one free radical polymerizable compound, at least one filler material and at least one photoinitiator for cationic and/or radical polymerization. An organic viscosity stabilizer material is brought into contact with the composition to substantially delay or prevent undesirable viscosity increase and subsequently premature polymerization. A filler material is added to the composition in an effective amount to at least delay or prevent a significant increase in viscosity and polymerization.Type: GrantFiled: July 14, 1998Date of Patent: August 8, 2000Assignee: Ciba Specialty Chemicals Corp.Inventors: Anastasios P. Melisaris, Stephen D. Hanna, Thomas H. Pang
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Patent number: 6100007Abstract: The present invention relates to novel resin compositions containing at least one solid or liquid actinic radiation-curable and cationically polymerizable organic substance, an actinic radiation-sensitive initiator for cationic polymerization, an actinic radiation-curable and radical-polymerizable organic substance and an actinic radiation-sensitive initiator for radical polymerization. The actinic radiation-curable and cationically polymerizable organic substance is at least one glycidylether of a polyhydric aliphatic, alicyclic or aromatic alcohol having at least three epoxy groups with epoxy equivalent weight between 90 and 800 grams per equivalent, at least one solid or liquid alicyclic epoxide with an epoxy equivalent weight between 90 and 330 grams per equivalent having at least two epoxy groups and monomer purity greater than about 90% by weight, or at least a solid or liquid epoxycresol novolac or epoxyphenol novolac having epoxy equivalent weight between 130 and 350, or mixtures thereof.Type: GrantFiled: April 6, 1998Date of Patent: August 8, 2000Assignee: Ciba Specialty Chemicals Corp.Inventors: Thomas H. Pang, Anastasios P. Melisaris, Wang Renyi, John W. Fong