Abstract: An impedance matching network and network assembly employ one or more variable inductive elements, wherein one or more of the variable inductive elements includes a high temperature ferrite core, a helical coil, and a means for physically translating the magnetic core through the helical coil. An impedance matching network may alternatively or additionally employ one or more variable inductive elements, wherein one or more of the variable inductive elements is cooled using a fan assembly. Further, the impedance matching network and network assembly may alternatively or additionally employ one or more variable inductive elements, wherein the cooling of one or more of the variable inductive elements is facilitated by increasing the surface area of the variable inductive element core.

Abstract: Apparatus including a chamber and a coil system for converting a field-generating current into a RF magnetic field in the chamber when the chamber contains an ionized gas which interacts with the RF magnetic field to create a plasma. The plasma is contained within a cylindrical region enclosed by the chamber, which region has a longitudinal center axis, and the region is considered to be made up of a plurality of annular zones concentric with the center axis and disposed at respectively different distances from the center axis. The coil system is composed of: a plurality of individual coils each positioned and dimensioned to produce a RF magnetic field which predominantly influences a respective annular zone.

Abstract: A probe cartridge assembly and a multi-probe assembly (10) including a mounting plate having a plurality of the probe cartridge assemblies mounted on the mounting plate. The probe cartridge assembly generally includes a mounting member, a probe insulator (30), a probe (40), a ferrule (50), a lead insulator (60), a retaining member (70), and a wire having an electrical lead. The electrical lead is positioned within a cavity in the ferrule, and an inclined surface of the ferrule is contacted to an inclined surface of the probe within an area defined by the probe insulator and the lead insulator. The probe insulator and the lead insulator are held within an area defined by the mounting member and the retaining member. The retaining member and the mounting member are adjustably mated to each other in order to provide a clamping force to ensure proper electrical interconnection between the electric lead, the ferrule, and the probe.

Abstract: A system and method for maintaining a plasma in a plasma region, by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The components at frequencies that are harmonics of the fundamental frequency are removed from the plasma by placing a body of an RF absorber material in energy receiving communication with the plasma, the body having a frequency dependent attenuation characteristic such that the body attenuates electrical energy at frequencies higher than the fundamental frequency more strongly than energy at the fundamental frequency.

Abstract: An RF electric field probe device for measuring an RF electric field intensity in a plasma. The device is composed essentially of an electric field sensing unit and an output unit. The electric field sensing unit is composed of a first electro-optical component positionable in the plasma and operable to modulate light as a function of variations of the RF electric field in the plasma at the fundamental frequency and harmonics of the RF electric field, and a first antenna unit electrically coupled to the first component for coupling the first component to the RF electric field. The output unit is coupled to the electric field sensing unit for providing an output signal containing information relating to the magnitude and frequency of the modulation which occurs in the first component. The probe device may be used to map a plasma region by moving the probe device to any selected point in the plasma region.

Abstract: An impedance matching network and network assembly employ one or more variable inductive elements, wherein one or more of the variable inductive elements includes a high temperature ferrite core, a helical coil, and a means for physically translating the magnetic core through the helical coil. An impedance matching network may alternatively or additionally employ one or more variable inductive elements, wherein one or more of the variable inductive elements is cooled using a fan assembly. Further, the impedance matching network and network assembly may alternatively or additionally employ one or more variable inductive elements, wherein the cooling of one or more of the variable inductive elements is facilitated by increasing the surface area of the variable inductive element core.

Abstract: A probe cartridge assembly and a multi-probe assembly (10) including a mounting plate having a plurality of the probe cartridge assemblies mounted on the mounting plate. The probe cartridge assembly generally includes a mounting member, a probe insulator (30), a probe (40), a ferrule (50), a lead insulator (60), a retaining member (70), and a wire having an electrical lead. The electrical lead is positioned within a cavity in the ferrule, and an inclined surface of the ferrule is contacted to an inclined surface of the probe within an area defined by the probe insulator and the lead insulator. The probe insulator and the lead insulator are held within an area defined by the mounting member and the retaining member. The retaining member and the mounting member are adjustably mated to each other in order to provide a clamping force to ensure proper electrical interconnection between the electric lead, the ferrule, and the probe.

Abstract: An AC power feed device for conducting electrical power from a source to a load. The feed device has a constant characteristic impedance along its length and an outer periphery that varies in size progressively along its length, or the feed device has an input end connected to the match network and an output end connected to an electrode, and has a characteristic impedance which varies from a value substantially equal to the output impedance of a match network coupled at the input end to a value equal to the impedance of the electrode.

Abstract: An electrode assembly for supplying RF power from a RF power source having an output impedance to an electrically non-linear medium, the assembly being composed of: a drive electrode in communication with the medium and forming with the medium a load impedance; and an impedance match network coupled between the RF power source and the drive electrode for matching the output impedance of the RF source to the load impedance. The match network has an output component that is directly connected to the drive electrode. The electrode assembly can further have a body of RF energy absorbing material disposed between the match network and the drive electrode, the absorbing material having a frequency dependent energy absorption characteristic which increases with frequency.

Abstract: An electrode assembly for supplying RF power from a RF power source having an output impedance to an electrically non-linear medium, the assembly being composed of: a drive electrode in communication with the medium and forming with the medium a load impedance; and an impedance match network coupled between the RF power source and the drive electrode for matching the output impedance of the RF source to the load impedance. The match network has an output component that is directly connected to the drive electrode. The electrode assembly can further have a body of RF energy absorbing material disposed between the match network and the drive electrode, the absorbing material having a frequency dependent energy absorption characteristic which increases with frequency.

Abstract: Apparatus and method for supplying a bias voltage to a wafer chuck in a plasma reactor system, in which an RF voltage source produces a relatively low frequency RF voltage, a VHF voltage source produces a VHF voltage having a higher frequency than the RF voltage, and a coupling circuit connected between the RF and VHF voltage sources and the wafer chuck combines the RF and VHF voltages for application to the wafer chuck.

Abstract: A system and method for maintaining a plasma in a plasma region, by supplying RF power at a fundamental frequency to the plasma region together with a gas in order to create an RF electromagnetic field which interacts with the gas to create a plasma that contains electromagnetic energy components at frequencies that are harmonics of the fundamental frequency. The components at frequencies that are harmonics of the fundamental frequency are removed from the plasma by placing a body of an RF absorber material in energy receiving communication with the plasma, the body having a frequency dependent attenuation characteristic such that the body attenuates electrical energy at frequencies higher than the fundamental frequency more strongly than energy at the fundamental frequency.

Abstract: An RF electric field probe device for measuring an RF electric field intensity in a plasma. The device is composed essentially of an electric field sensing unit and an output unit. The electric field sensing unit is composed of a first electro-optical component positionable in the plasma and operable to modulate light as a function of variations of the RF electric field in the plasma at the fundamental frequency and harmonics of the RF electric field, and a first antenna unit electrically coupled to the first component for coupling the first component to the RF electric field. The output unit is coupled to the electric field sensing unit for providing an output signal containing information relating to the magnitude and frequency of the modulation which occurs in the first component. The probe device may be used to map a plasma region by moving the probe device to any selected point in the plasma region.

Abstract: An AC power feed device for conducting electrical power from a source to a load. The feed device has a constant characteristic impedance along its length and an outer periphery that varies in size progressively along its length, or the feed device has an input end connected to the match network and an output end connected to an electrode, and has a characteristic impedance which varies from a value substantially equal to the output impedance of a match network coupled at the input end to a value equal to the impedance of the electrode.

Abstract: Apparatus including a chamber and a coil system for converting a field-generating current into a RF magnetic field in the chamber when the chamber contains an ionized gas which interacts with the RF magnetic field to create a plasma. The plasma is contained within a cylindrical region enclosed by the chamber, which region has a longitudinal center axis, and the region is considered to be made up of a plurality of annular zones concentric with the center axis and disposed at respectively different distances from the center axis. The coil system is composed of: a plurality of individual coils each positioned and dimensioned to produce a RF magnetic field which predominantly influences a respective annular zone.