Patents by Inventor Thomas Henricus Jacobus Verhagen

Thomas Henricus Jacobus Verhagen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7545478
    Abstract: A lithographic apparatus having an illumination system configured to provide a radiation beam; a support structure configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section, thus providing a patterned radiation beam; a substrate table configured to hold a substrate; a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a projection system support configured to support the projection system on a reference frame. The lithographic apparatus further includes a thermal conditioning system configured to thermally condition the projection system support. The invention further relates to a thermal conditioning system constructed and arranged to thermally condition a projection system support. The invention further relates to a device manufacturing method and a method for manufacturing a device.
    Type: Grant
    Filed: May 5, 2004
    Date of Patent: June 9, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Wilhelmus Josephus Box, Bernardus Antonius Johannes Luttikhuis, Thomas Henricus Jacobus Verhagen